Browsing by Subject "Molecular beam epitaxy"

Now showing 1 - 14 of 14

Open Access
45 GHz bandwidth-efficiency resonant cavity enhanced ITO-Schottky photodiodes
(OSA, 2001) Bıyıklı, Necmi; Kimukin, İbrahim; Aytür, Orhan; Özbay, Ekmel; Gökkavas, M.; Ünlü, M. S.
We demonstrated high-performance resonant cavity enhanced ITO-Schottky photodiodes. We achieved a peak efficiency of 75% around 820 nm with a 3-dB bandwidth of 60 GHz resulting in a bandwidth-efficiency product of 45 GHz.
Open Access
Effect of the passivation layer on the noise characteristics of mid-wave-infrared InAs / GaSb superlattice photodiodes
(IEEE, 2012) Tansel, T.; Kutluer, K.; Salihoglu, Ö.; Aydınlı, Atilla; Aslan, B.; Arikan, B.; Kilinc, M. C.; Ergun, Y.; Serincan, U.; Turan, R.
The authors describe the noise characterization of a mid-wavelength- infrared (MWIR) photodiode based on indium arsenide and gallium antimonide (InAs/GaSb) superlattice (SL), addressing the influence of different passivation layers applied to the surface of the device. The MWIR InAs/GaSb SL design structure is based on p-i-n configuration grown by the molecular beam epitaxy on a (001) n-GaSb substrate. The SiO 2-passivated SL photodiodes demonstrated a Schottky-limited noise up to a bias voltage of -0.1 V where the measured peak responsivity is 1.37 A/W with a cut-off wavelength of 4.9 μm and the specific detectivity as high as 1.23 × 10 12 cm. Hz 1/2 W , demonstrating the high quality of the fabricated MWIR SL photodiodes. The noise measurements exhibited a frequency-dependent plateau (i.e., 1/f noise) for unpassivated and Si 3N 4-passivated samples, whereas 1/f-type noise suppression (i.e., frequency-independent plateau) with a noise current reduction at about 30 Hz of more than one order of magnitude was observed for the SiO 2-passivated ones.
Open Access
High-speed 1.55 μm operation of low-temperature-grown GaAs-based resonant-cavity-enhanced p-i-n photodiodes
(American Institute of Physics, 2004) Butun, B.; Bıyıklı, Necmi; Kimukin, I.; Aytur, O.; Özbay, Ekmel; Postigo, P. A.; Silveira, J. P.; Alija, A. R.
The 1.55 μm high-speed operation of GaAs-based p-i-n photodiodes was demonstrated and their design, growth and fabrication were discussed. A resonant-cavity-detector structure was used to selectively enhance the photoresponse at 1.55 μm. The bottom mirror of the resonant cavity was formed by a highly reflecting 15-pair GaAs/AlAs Bragg mirror and molecular-beam epitaxy was used for wafer growth. It was found that the fabricated devices exhibited a resonance of around 1548 nm and an enhancement factor of 7.5 was achieved when compared to the efficiency of a single-pass detector.
Open Access
High-speed InGaAs based resonant cavity enhanced p-i-n photodiodes
(IEEE, 2001) Kimukin, İbrahim; Bıyıklı, Necmi; Özbay, Ekmel
High-speed InGaAs based resonant cavity enhanced photodiodes were discussed. The responses of the photodiodes was measured under high incident optical powers. Bandwidth-efficiency (BWE) product was used to measure the performance of the photodiode. Transfer matrix method was used to design the epilayer structure and to simulate the optical properties of the photodiode. Photo response measurements were carried out in 1450 nm to 1700 nm range using a tungsten-halogen projection lamp as the light source and a single pass monochromator. The deconvolved Fourier transform of the data was found to have a bandwidth of 31 GHz under conditions of 40 GHz limit.
Open Access
High-speed widely-tunable >90% quantum-efficiency resonant cavity enhanced p-i-n photodiodes
(IEEE, 1998) Bıyıklı, Necmi; Kimukin, İbrahim; Aytür, Orhan; Gökkavas, M.; Ulu, G.; Mirin, R.; Christensen, D. H.; Ünlü, M. S.; Özbay, Ekmel
Widely-tunable high-speed resonant cavity enhanced p-i-n photodiodes were designed, fabricated and tested for operation around 820 nm. The structure was grown by solid-source MBE on GaAs substrates and features high-reflectivity Bragg mirrors made of quarter-wave Al0.20Ga0.80As/AlAs stacks. Photoresponse and photospectral measurements were carried out. The tuning of the resonance wavelength within the Bragg mirror's upper and lower edges was observed. Quantum efficiency greater than 90% was demonstrated.
Open Access
In-situ focused ion beam implantation for the fabrication of a hot electron transistor oscillator structure
(1996) Kaya I.I.; Dellow, M.W.; Bending, S.J.; Linfield, E.H.; Rose P.D.; Ritchie, D.A.; Jones G.A.C.
Recent advances using in situ focused ion beam implantation during an MBE growth interruption have been exploited to fabricate planar GaAs hot electron structures without the need for shallow ohmic contacts. This novel fabrication route shows a very high yield and has been used to demonstrate a prototype high-frequency oscillator structure based on electron multiplication in the base layer. Existing devices show transfer factors in excess of unity as well as reversal of the base current at high injection levels, which are the prerequisites for oscillator action. Future improvements in device design are discussed.
Open Access
Initial stages of SiGe epitaxy on Si(001) studied by scanning tunneling microscopy
(Elsevier BV, 1995) Oral, A.; Ellialtioglu, R.
We have studied the initial stages of strained SiGe alloy growth on the Si(001)-(2 × 1) surface by scanning tunneling microscopy. The Si0.36Ge0.64 alloy was grown on the silicon substrate at various coverages (0.13-3.6 ML) and at different temperatures (∼ 310-470°C). The growth was one dimensional, preferring the direction perpendicular to the underlying silicon dimer rows at low coverages and low temperatures. Anti-phase boundaries were observed to lead multi-layer growth. Strong interaction between the overlayer and the substrate was found to buckle the substrate as well as SiGe dimers. Different growth mechanisms, island formation and step flow, were identified at low and high substrate temperatures. (2 × n) ordering of the strained overlayer was only observed at an intermediate growth temperature (∼ 390°C). © 1995.
Open Access
Linear electro-optic coefficient in multilayer self-organized InAs quantum dot structures
(IEEE, 2007) Akca, B. Imran; Dana, Aykutlu; Aydınlı, Atilla; Rossetti, M.; Li L.; Dagli, N.; Fiore, A.
The electro-optic coefficients of self-organized InAs quantum dot layers in molecular beam epitaxy grown laser structures in reverse bias have been investigated. Enhanced electrooptic coefficients compared to bulk GaAs were observed. © 2003 Optical Society of America.
Open Access
Modulation in InAs quantum dot waveguides
(Optical Society of America, 2007) Akca, B. Imran; Dana, Aykutlu; Aydınlı, Atilla; Rossetti, M.; Li L.; Fiore, A.; Dagli, N.
Modulation in molecular beam epitaxy grown self-assembled InAs quantum dot waveguides have been studied at 1500 nm as a function of wavelength and voltage. Enhanced electro-optic coefficients compared to bulk GaAs were observed. © 2007 Optical Society of America.
Open Access
Optical studies of molecular beam epitaxy grown GaAsSbN / GaAs single quantum well structures
(A I P Publishing LLC, 2007) Nunna, K.; Iyer, S.; Wu, L.; Bharatan, S.; Li J.; Bajaj, K. K.; Wei, X.; Senger, R. T.
In this work, the authors present a systematic study on the variation of the structural and the optical properties of GaAsSbNGaAs single quantum wells (SQWs) as a function of nitrogen concentration. These SQW layers were grown by the solid source molecular beam epitaxial technique. A maximum reduction of 328 meV in the photoluminescence (PL) peak energy of GaAsSbN was observed with respect to the reference GaAsSb QW. 8 K and RT PL peak energies of 0.774 eV (FWHM of ∼25 meV) and 0.729 eV (FWHM of ∼67 meV) (FWHM denotes full width at half maximum) corresponding to the emission wavelengths of 1.6 and 1.7 μm, respectively, have been achieved for a GaAsSbN SQW of N∼1.4%. The pronounced S -curve behavior of the PL spectra at low temperatures is a signature of exciton localization, which is found to decrease from 16 to 9 meV with increasing N concentration of 0.9%-2.5%. The diamagnetic shift of 13 meV observed in the magnetophotoluminescence spectra of the nitride sample with N∼1.4% is smaller in comparison to the value of 28 meV in the non-nitride sample, indicative of an enhancement in the electron effective mass in the nitride QWs. Electron effective mass of 0.065 mo has been estimated for a SQW with N∼1.4% using the band anticrossing model.
Open Access
Preferential MBE growth and characterization of SiGe nanoislands on depth-selective Si Pits Etched by Ar+ Plasma
(Wiley-VCH Verlag, 2018) Şeker, İ.; Karatutlu, A.; İstengir, S.
In this study, the size selective deposition of SiGe nanoislands is demonstrated to be possible only in Si nanopits using a molecular beam epitaxy (MBE) system. The depth of the etched Si substrate prepared by Ar+ plasma etching just before the deposition seems to be playing a role in the selectivity of keeping the SiGe nanoislands only inside the nanopits. We observed that, when the thickness of the deposited SiGe layer is around the mean pit depth, which is 4 nm in this case, Ge nucleation takes place selectively on the pre-etched pits. Relatively larger deposition thickness (e.g., 40 nm) is demonstrated to suppress the preferential growth of the Ge nanocrystals (NCs)/Si NCs which are in return observed all along the surface of the Si substrate. On the other hand, surface migration is considered to play a role in very small depth (relatively more shallow pits) and yielding the unfilled Si nanopits (ca. 1.5 nm) whereas Ge NCs selectively nucleate only within those having larger depths (ca. 3 nm). Such site-specific 3D controlled growth of nanoislands is shown for the deposition of different semiconductor nanocrystals on top of another for formation of nanodevices fabricated in a single nanopit.
Open Access
Raman and TEM studies of Ge nanocrystal formation in SiOx: Ge/SiOx multilayers
(Wiley, 2007) Dana, Aykutlu; Aǧan, S.; Tokay, S.; Aydınlı, Atilla; Finstad, T. G.
Alternating germanosilicate-siliconoxide layers of 10-30 nm thickness were grown on Si substrates by plasma enhanced chemically vapor deposition (PECVD). The compositions of the grown films were determined by X-ray photoelectron spectroscopy measurements. The films were annealed at temperatures varying from 670 to 1000°C for 5 to 45 minutes under nitrogen atmosphere. High resolution cross section TEM images, electron diffraction and electron energy-loss spectroscopy as well as energy-dispersive X-ray analysis (EDAX) data confirm presence of Ge nanocrystals in each layer. The effect of annealing on the Ge nanocrystal formation in multilayers was investigated by Raman spectroscopy and Transmission Electron Microscopy (TEM). As the annealing temperature is raised to 850°C, single layer of Ge nanocrystals observed at lower annealing temperatures is transformed into a double layer with the smaller sized nanocrystals closer to the substrate SiO2 interface.
Open Access
Raman scattering from confined phonons in GaAs/AlGaAs quantum wires
(Academic Press, 1998) Bairamov, B. H.; Aydınlı, Atilla; Tanatar, Bilal; Güven, K.; Gurevich, S.; Mel'tser, B. Ya.; Ivanov, S. V.; Kop'ev, P. S.; Smirnitskii, V. B.; Timofeev, F. N.
We report on photoluminescence and Raman scattering performed at low temperature (T = 10 K) on GaAs/Al 0.3Ga 0.7As quantum-well wires with effective wire widths of L = 100.0 and 10.9 nm prepared by molecular beam epitaxial growth followed by holographic patterning, reactive ion etching, and anodic thinning. We find evidence for the existence of longitudinal optical phonon modes confined to the GaAs quantum wire. The observed frequency at ω L10 = 285.6 cm -1 for L = 11.0 nm is in good agreement with that calculated on the basis of the dispersive dielectric continuum theory of Enderlein† as applied to the GaAs/Al 0.3Ga 0.7As system. Our results indicate the high crystalline quality of the quantum-well wires fabricated using these techniques. © 1998 Academic Press.
Open Access
Surfactant-mediated growth of semiconductor materials
(Institute of Physics Publishing, 2002) Fong, C. Y.; Watson, M. D.; Yang, L. H.; Çıracı, Salim
During epitaxial growth of semiconducting materials using either molecular beam epitaxy or organometallic vapour deposition, the addition of a surfactant can enhance two-dimensional layer-by-layer growth. This modified growth process is now called the surfactant-mediated growth (SMG) method. It has had an important impact on the development of technologically important materials in device applications, such as heterostructures used for laser applications. Recent developments that use surfactants to improve doping profiles in semiconducting systems and antisurfactants (ASMG) to grow quantum dots further ensure that SMG/ASMG will play a major role in the future development of optoelectronic materials and nanoparticles. In this paper, we review important earlier experimental work involving the SMG method as well as some recent developments. Theoretical work involving first-principles methods and kinetic Monte Carlo simulations are discussed but confined only to the surfactant effect.