Browsing by Subject "Schottky"
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Item Open Access A1GaN UV photodetectors : from micro to nano(Bilkent University, 2011) Bütün, SerkanThe absorption edge of AlGaN based alloys can be tuned from deep UV to near UV by changing the composition. This enables the use of the material in various technological applications such as military, environmental monitoring and biological imaging. In this thesis, we proposed and demonstrated various UV photodetectors for different purposes. The multi-band photodetectors have the unique ability to sense the UV spectrum in different portions at the same time. We demonstrated monolithically integrated dual and four-band photodetectors with multi layer structures grown on sapphire. This was achieved through epitaxial growth of multi AlGaN layers with decreasing Al content. We suggested two different device architectures. First one has separate filter and active layers, whereas the second one has all active layers which are used as filter layers as well. The full width at half maximum (FWHM) values for the dual band photodetector was 11 and 22 nm with more than three orders of magnitude inter-band rejection ratio. The self-filtering four band photodetector has FWHMs of 18, 17, 22 and 9 nm from longer to shorter bands. Whereas photodetector with separate filter layers has FWHMs of 8, 12, 11 and 8 nm, from longer to shorter bands. The overall inter-band rejection ration was increased from about one to two of magnitude after incorporating the passive filter layers. The plasmonic enhancement of photonic devices has attracted much attention for the past decade. However, there is not much research that has been conducted in UV region. In the second part of this thesis, we fabricated nanostructures on GaN based photodetectors and improved the responsivity of the device. We have fabricated Al nano-particles on sapphire with e-beam lithography. We characterized their response via spectral extinction measurements. We integrated these particles with GaN photodetectors and had enhancement of %50 at the plasmonic resonance of the nano-particles. Secondly, we have fabricated sub-wavelength photodetectors on GaN coupled with linear gratings. We had 8 fold enhancement in the responsivity at the plasmonic resonance frequency of the grating at normal incidence. Numerical simulations revealed that both surface plasmons and the unbound leaky surface waves played a role in the enhancement. We, finally, conducted basic research on the current transport mechanisms in Schottky barriers of AlGaN based materials. Experiments revealed that the tunneling current plays a major role in current transport. In addition incorporation, of a thin insulator between metalsemiconductor interface reduces the undesired surface states thereby improving the device performance.Item Open Access Design and characterization of resonant cavity enhanced Schottky photodiodes(Bilkent University, 1996) Gökkavas, MutluRecently, novel photodetectors which employ a multiple-pass detection scheme to increase the efficiency-bandwidth product have been developed. In this thesis. we present our work on .\iAs/GaAs resonant cavity enhanced (RCE) Schottky photodiodes w'ith an InGaAs absorber. Quantum efficiency enhancement is acconiplished by placing the InGaAs absorber inside a Fabry-Perot microcavity whose mirrors are formed b}' the Au Schottky layer cind an rVlAs/GaAs quarter wave stcick (QWS) reflector. In the design and analysis of the structures, scattering (S) matrices are used. Reflectivity, transmissivity, quantum efficiency, and the loss in the Schottky metal are calculated, a.nd it is shown that, it is ¡possible to diminish the front-surface reflectivity using a Si:iN.| dielectric coating to optimize the quantum efficiency. High speed and spectral efficiency/ measurements on fabricated photodiodes are also presented.Item Open Access Design, fabrication and characterization of high-performance solarblind AlGaN photodetectors(SPIE, 2005) Özbay, EkmelDesign, fabrication, and characterization of high-performance AlxGal-xN-based photodetectors for solar-blind applications are reported. AlxGal-xN heterostructures were designed for Schottky, p-i-n, and metal-semiconductor-metal (MSM) photodiodes. The resulting solar-blind AlGaN detectors exhibited low dark current, high detectivity, and high bandwidth.Item Open Access Forward tunneling current in Pt/p-InGaN and Pt/n-InGaN Schottky barriers in a wide temperature range(Elsevier, 2012-07-27) Arslan, E.; Çakmak, H.; Özbay, EkmelThe current-transport mechanisms of the Pt contacts on p-InGaN and n-InGaN were investigated in a wide temperature range (80-360 K) and in the forward bias regime. It was found that the ideality factor (n) values and Schottky barrier heights (SBHs), as determined by thermionic emission (TE), were a strong function of temperature and Φb0 show the unusual behavior of increasing linearly with an increase in temperature from 80 to 360 K for both Schottky contacts. The tunneling saturation ( JTU(0)) and tunneling parameters (E 0) were calculated for both Schottky contacts. We observed a weak temperature dependence of the saturation current and a fairly small dependence on the temperature of the tunneling parameters in this temperature range. The results indicate that the dominant mechanism of the charge transport across the Pt/p-InGaN and Pt/n-InGaN Schottky contacts are electron tunneling to deep levels in the vicinity of mixed/screw dislocations in the temperature range of 80-360 K.Item Open Access High performance AlxGa1-xN-based avalanche photodiodes(Elsevier BV, 2007-10) Tut, T.; Butun, B.; Gokkavas, M.; Özbay, EkmelWe report high performance solar-blind photodetectors with reproducible avalanche gain as high as 820 under ultraviolet illumination. The solar-blind photodetectors have a sharp cut-off around 276 nm. We improved the device performance by designing different epitaxial wafer structure with thinner active multiplication layer. We compare the resulting fabricated devices from these wafers in terms of dark current, photoresponse, avalanche gain performances.Item Open Access High-performance solar-blind AlGaN photodetectors(SPIE, 2005) Özbay, Ekmel; Tut, Turgut; Bıyıklı, N.Design, fabrication, and characterization of high-performance Al xGa1-xN-based photodetectors for solar-blind applications are reported. AlxGa1-xN heterostructures were designed for Schottky, p-i-n, and metal-semiconductor-metal (MSM) photodiodes. The solar-blind photodiode samples were fabricated using a microwave compatible fabrication process. The resulting devices exhibited extremely low dark currents. Below 3 fA leakage currents at 6 V and 12 V reverse bias were measured on p-i-n and Schottky photodiode samples respectively. The excellent current-voltage (I-V) characteristics led to a detectivity performance of 4.9×1014 cmHz1/2W-1. The MSM devices exhibited photoconductive gain, while Schottky and p-i-n samples displayed 0.15 A/W and 0.11 A/W peak responsivity values at 267 nm and 261 nm respectively. All samples displayed true solar-blind response with cut-off wavelengths smaller than 280 nm. A visible rejection of 4×104 was achieved with Schottky detector samples. High speed measurements at 267 nm resulted in fast pulse responses with >GHz bandwidths. The fastest devices were MSM photodiodes with a maximum 3-dB bandwidth of 5.4 GHz.Item Open Access High-performance solar-blind photodetectors based on AlxGa 1_xN heterostructures(IEEE, 2004) Özbay, Ekmel; Bıyıklı, Necmi; Kimukin, I.; Kartaloglu, T.; Tut, T.; Aytür, O.Design, fabrication, and characterization of high-performance AI xGa1-xN-based photodetectors for solar-blind applications are reported. AlxGa1-xN heterostructures were designed for Schottky. p-i-n, and metal-semicondnctor-metal (MSM) photodiodes. The solar-blind photodiode samples were fabricated using a microwave compatible fabrication process. The resulting devices exhibited extremely low dark currents. Below 3 fA, leakage currents at 6-V reverse bias were measured on p-i-n samples. The excellent current-voltage (I-V) characteristics led to a detectivity performance of 4.9×1014 cmHz1/2W -1. The MSM devices exhibited photoconductive gain, while Schottky and p-i-n samples displayed 0.09 and 0.11 A/W peak responsivity values at 267 and 261 nm, respectively. A visible rejection of 2×104 was achieved with Schottky samples. High-speed measurements at 267 nm resulted in fast pulse responses with greater than gigahertz bandwidths. The fastest devices were MSM photodiodes with a maximum 3-dB bandwidth of 5.4 GHz.Item Open Access High-speed visible-blind GaN-based ITO-Schottky photodiodes(SPIE, 2002) Bıyıklı, Necmi; Kimukin, İbrahim; Kartaloğlu, Tolga; Aytür, Orhan; Özbay, EkmelIn this paper we present our efforts on the design, fabrication and characterization of high-speed, visible-blind, GaN-based ultra-violet (UV) photodiodes using indium-tin-oxide (ITO) Schottky contacts. ITO is known as a transparent conducting material for the visible and near infrared part of the electromagnetic spectrum. We have investigated the optical properties of thin ITO films in the ultraviolet spectrum The transmission and reflection measurements showed that thin ITO films had better transparencies than thin Au films for wavelengths greater than 280 mn. Using a microwave compatible fabrication process, we have fabricated Au and ITO based Schottky photediodes on n-/n+ GaN epitaxial layers. We have made current-voltage (I-V), spectral quantum efficiency, and high-speed characterization of the fabricated devices. I-V characterization showed us that the Au-Schottky samples had better electrical characteristics mainly due to the larger Schottky barrier. However, due to the better optical transparency, ITO-Schottky devices exhibited higher quantum efficiencies compared to Au-Schottky devices. ITO-Schottky photodiodes with ∼80 nm thick ITO films resulted in a maximum quantum efficiency of 47%, whereas Au-Schottky photodiode samples with ∼10 nm thick Au films displayed a maximum efficiency of 27% in the visible-blind spectrum. UV/visible rejection ratios over three orders of magnitude were obtained for both samples. High-frequency characterization of the devices was performed via pulse-response measurements at 360 nm. ITO-Schottky photodiodes showed excellent high-speed characteristics with rise times as small as 12 psec and RC-time constant limited pulse-widths of 60 psec.Item Open Access ITO-schottky photodiodes for high-performance detection in the UV-IR spectrum(IEEE, 2004) Bıyıklı, Necmi; Kimukin, I.; Butun, B.; Aytür, O.; Özbay, EkmelHigh-performance vertically illuminated Schottky photodiodes with indium-tin-oxide (ITO) Schottky layers were designed, fabricated, and tested. Ternary and quarternary III-V material systems (AlGaN-GaN, AlGaAs-GaAs, InAlGaAs-InP, and InGaAsP-InP) were utilized for detection in the ultraviolet (UV) (λ < 400 nm), near-IR (λ ∼ 850 nm), and IR (λ ∼ 1550 nm) spectrum. The material properties of thin ITO films were characterized. Using resonant-cavity-enhanced (RCE) detector structures, improved efficiency performance was achieved. Current-voltage, spectral responsivity, and high-speed measurements were carried out on the fabricated ITO-Schottky devices. The device performances obtained with different material systems are compared.Item Open Access Plasmonic gratings for enhanced near infrared sensitivity of Silicon based Schottky photodetectors(IEEE, 2011) Polat, Kazım Gürkan; Aygun, Levent Erdal; Okyay, Ali KemalSchottky photodetectors have been intensively investigated due to their high speeds, low device capacitances, and sensitivity in telecommunication standard bands, in the 0.8μm to 1.5μm wavelength range. Due to extreme cost advantage of Silicon over compound semiconductors, and seamless integration with VLSI circuits, metal-Silicon Schottky photodetectors are attractive low cost alternatives to InGaAs technology. However, efficiencies of Schottky type photodetectors are limited due to thin absorption region. Previous efforts such as resonant cavities increase the sensitivity using optical techniques, however their integration with VLSI circuits is difficult. Therefore, there is a need for increasing Schottky detector sensitivity, in a VLSI compatible fashion. To address this problem, we design plasmonic grating structures to increase light absorption at the metal-Silicon Schottky interface. There are earlier reports of plasmonic structures to increase Schottky photodetector sensitivity, with a renowned interest in the utilization of plasmonic effects to improve the absorption characteristics of metal-semiconductor interfaces. In this work, we report the design, fabrication and characterization of Gold-Silicon Schottky photodetectors with enhanced absorption in the near infrared region. © 2011 IEEE.Item Open Access Plasmonically enhanced silicon infrared Schottky detector(Bilkent University, 2011) Polat, Kazım Gürkan