Browsing by Subject "Passivation"

Now showing 1 - 20 of 29

Open Access
Ab initio study of electronic properties of armchair graphene nanoribbons passivated with heavy metal elements
(Elsevier, 2019) Narin, P.; Abbas, J. M.; Atmaca, G.; Kutlu, E.; Lisesivdin, S. B.; Özbay, Ekmel
In this study, electronic properties of graphene nanoribbons with armchair edges (AGNRs) have been investigated with Density Functional Theory (DFT). Effects of heavy metal (HM) elements, including Zinc (Zn), Cadmium (Cd) and Mercury (Hg) atoms on electronic behavior of AGNRs have been calculated by passivating for both one and two edges of AGNRs in detail. To explain the electronic behavior of investigated AGNRs, the electronic band structure, the density of states (DOS), total energy have been calculated. Energetically favorable structures have been determined using calculated binding energy values. The obtained bandgap values of investigated structures changes between 0.30 and 0.64 eV. Increasing atomic number of passivation atoms have led to an increment in the bandgap of AGNRs.
Open Access
Ab initio study of Ru-terminated and Ru-doped armchair graphene nanoribbons
(Taylor and Francis, 2012) Sarikavak-Lisesivdin, B.; Lisesivdin, S. B.; Özbay, Ekmel
We investigate the effects of ruthenium (Ru) termination and Ru doping on the electronic properties of armchair graphene nanoribbons (AGNRs) using first-principles methods. The electronic band structures, geometries, density of states, binding energies, band gap information, and formation energies of related structures are calculated. It is well founded that the electronic properties of the investigated AGNRs are highly influenced by Ru termination and Ru doping. With Ru termination, metallic band structures with quasi-zero-dimensional, one-dimensional and quasi-one-dimensional density of states (DOS) behavior are obtained in addition to dominant one-dimensional behavior. In contrast to Ru termination, Ru doping introduces small but measurable (12.4 to 89.6meV) direct or indirect band gaps. These results may present an additional way to produce tunable band gaps in AGNRs.
Open Access
All-solution-processed, oxidation-resistant copper nanowire networks for optoelectronic applications with year-long stability
(American Chemical Society, 2020) Polat-Genlik, S.; Tigan, D.; Koçak, Yusuf; Ercan, Kerem Emre; Çiçek, Melih Ogeday; Tunca, S.; Koylan, S.; Coşkun, Ş.; Özensoy, Emrah; Ünalan, H. E.
Copper nanowires (Cu NWs) hold promise as they possess equivalent intrinsic electrical conductivity and optical transparency to silver nanowires (Ag NWs) and cost substantially less. However, poor resistance to oxidation is the historical challenge that has prevented the large-scale industrial utilization of Cu NWs. Here, we use benzotriazole (BTA), an organic corrosion inhibitor, to passivate Cu NW networks. The stability of BTApassivated networks under various environmental conditions was monitored and compared to that of bare Cu NW control samples. BTA passivation greatly enhanced the stability of networks without deteriorating their optoelectronic performance. Moreover, to demonstrate their potential, BTA-passivated networks were successfully utilized in the fabrication of a flexible capacitive tactile sensor. This passivation strategy has a strong potential to pave the way for large-scale utilization of Cu NW networks in optoelectronic devices.
Open Access
Atomic layer deposited Al 2O 3 passivation of type II InAs/GaSb superlattice photodetectors
(AIP, 2012) Salihoğlu, Ömer; Muti, Abdullah; Kutluer, Kutlu; Tansel, T.; Turan, R.; Kocabaş, Coşkun; Aydınlı, Atilla
Taking advantage of the favorable Gibbs free energies, atomic layer deposited (ALD) aluminum oxide (Al 2O 3) was used as a novel approach for passivation of type II InAs/GaSb superlattice (SL) midwave infrared (MWIR) single pixel photodetectors in a self cleaning process (λ cut-off ∼ 5.1 m). Al 2O 3 passivated and unpassivated diodes were compared for their electrical and optical performances. For passivated diodes, the dark current density was improved by an order of magnitude at 77 K. The zero bias responsivity and detectivity was 1.33 A/W and 1.9 × 10 13 Jones, respectively at 4μm and 77 K. Quantum efficiency (QE) was determined as 41 for these detectors. This conformal passivation technique is promising for focal plane array (FPA) applications. © 2012 American Institute of Physics.
Open Access
Changes in the resistance to corrosion of thermally passivated titanium aluminide during exposure to sodium chloride solution
(Kluwer Academic Publishers, 2015) Saebnoori, E.; Shahrabi, T.; Jafarian H.; Ghaffari, M.
In this study the surface of Ti-47Al-2Cr (at. %) was modified by heating and exposure to nitrogen gas flow to form a predominantly oxide layer on the surface. Samples were then immersed in Ringer's solution and 3.5 wt. % sodium chloride solution and electrochemical impedance spectroscopy tests were performed at regular intervals. The results showed that the layer is highly resistant to corrosion. The equivalent circuit proposed for the impedance curves includes a Warburg element, because diffusion is controlling charge transfer through the passive surface layer. The resistance of the layer was not significantly reduced even after 300 h exposure to solutions and scanning electron micrographs showed the surface was not damaged. © 2013 Springer Science+Business Media Dordrecht.
Open Access
A Comparative Passivation Study for InAs / GaSb Pin Superlattice Photodetectors
(IEEE Institute of Electrical and Electronics Engineers, 2013-08) Salihoglu, O.; Muti, A.; Aydınlı, Atilla
In the quest to find ever better passivation techniques for infrared photodetectors, we explore several passivation layers using atomic layer deposition (ALD). We compare the impact of these layers on detectors fabricated under same conditions. We use ALD deposited Al2O3, HfO2, TiO2, ZnO, plasma enhanced chemical vapor deposition deposited SiO2, Si3N4, and sulfur containing octadecanethiol self assembled monolayer passivation layers on InAs/GaSb p-i-n superlattice diodes with an average cutoff wavelength of 5.1 mu m. Passivated and unpassivated photodetectors compared for their electrical performances.
Open Access
Effect of deposition technique of SiNx passivation layer on the electrical DC and RF properties of AlGaN/GaN HEMTs
(Springer, 2023-12-07) Güler, Yağmur; Onaylı, Barış; Haliloğlu, Mehmet Taha; Yılmaz, Doğan; Asar, Tarık; Özbay, Ekmel
In this paper, we present the results of a comparative analysis of two alternative SiNx passivation techniques of AlGaN/GaN high electron mobility transistor (HEMT) manufactured using identical epitaxial structure and fabrication processes. AlGaN/GaN HEMT has demonstrated excellent device characteristics, making them excellent candidates for high power, high frequency, and low noise applications. However, the full potential of GaN HEMTs in large signal operation at high frequency is limited by trapping effects and leakage currents at the interface between the epitaxial structure and passivation layer. A SiNx passivation layer has commonly been used to prevent electron trapping at the surface by providing extra positive charges to neutralize trapped negative electrons on the surface. This comparative study investigates the effects of a 75 nm SiNx passivation layer fabricated using both plasma-enhanced chemical vapor deposition (PECVD) and inductively coupled plasma chemical vapor deposition (ICPCVD) techniques on the DC and RF performance of the transistor.
Open Access
The effect of insulator layer thickness on the main electrical parameters in (Ni/Au)/AlxGa1-xN/AIN/GaN heterostructures
(Wiley, 2010) Altindal, S.; Şafak, Y.; Taşçloǧlu I.; Özbay, Ekmel
(Ni/Au)Alx Ga1-x N/AlN/GaN(x = 0.22) heterostructures with and without a passivation layer of the SiNx were fabricated in order to see the effect of the insulator layer on the main electrical parameters such as zero-bias barrier height (BH) (φBO), ideality factor (n), series resistance (Rs) of the structure, and the interface state density (Nss). Some of these parameters were determined from both I-V and admittance (C-V and G/ω-V) measurements at room temperature and at 1 MHz and were compared. The experimental results show that the value of N ss in a Schottky contact without passivation is nearly 1 order of magnitude larger than that in a Schottky contact with SiNx passivation layers. Also, the values of Rs increase with the increasing thickness of the passivation layer. In the forward bias region, the negative values of capacitance are an attractive result of this study. This negative capacitance disappears in presence of the passivation layer. Copyright © 2010 John Wiley & Sons, Ltd.
Open Access
Effect of the passivation layer on the noise characteristics of mid-wave-infrared InAs / GaSb superlattice photodiodes
(IEEE, 2012) Tansel, T.; Kutluer, K.; Salihoglu, Ö.; Aydınlı, Atilla; Aslan, B.; Arikan, B.; Kilinc, M. C.; Ergun, Y.; Serincan, U.; Turan, R.
The authors describe the noise characterization of a mid-wavelength- infrared (MWIR) photodiode based on indium arsenide and gallium antimonide (InAs/GaSb) superlattice (SL), addressing the influence of different passivation layers applied to the surface of the device. The MWIR InAs/GaSb SL design structure is based on p-i-n configuration grown by the molecular beam epitaxy on a (001) n-GaSb substrate. The SiO 2-passivated SL photodiodes demonstrated a Schottky-limited noise up to a bias voltage of -0.1 V where the measured peak responsivity is 1.37 A/W with a cut-off wavelength of 4.9 μm and the specific detectivity as high as 1.23 × 10 12 cm. Hz 1/2 W , demonstrating the high quality of the fabricated MWIR SL photodiodes. The noise measurements exhibited a frequency-dependent plateau (i.e., 1/f noise) for unpassivated and Si 3N 4-passivated samples, whereas 1/f-type noise suppression (i.e., frequency-independent plateau) with a noise current reduction at about 30 Hz of more than one order of magnitude was observed for the SiO 2-passivated ones.
Open Access
Electrical and chemical characterization of chemically passivated silicon surfaces
(IEEE, 2008) Chhabra, B.; Süzer, Şefik; Opila, R. L.; Honsberg, C. B.
The surface composition of chemically passivated silicon substrates is investigated using XPS and FTIR techniques. The samples are passivated with methanol, quinhydrone-methanol and iodine-methanol solution after HF treatment. The minority carrier lifetimes of these chemically passivated silicon substrates are also measured. Quinhydrone-methanol solution provides a chemically inert surface and a considerably longer minority carrier lifetime.
Open Access
Electronic properties of zigzag ZnO nanoribbons with hydrogen and magnesium passivations
(Elsevier, 2018) Abbas, J. M..; Narin, P.; Kutlu, E.; Lisesivdin, S. B.; Özbay, Ekmel
In this study, the electronic properties of ZnO nanoribbons with zigzag edges (ZZnONr) have been investigated with Density Functional Theory (DFT). After a geometric optimization, the electronic band structures, the density of states (DOS) of ZZnONr passivated with Hydrogen (H) and Magnesium (Mg) atoms were calculated ZZnONr. It is shown that the increasing width of ZZnONrs has led to a decrement in energy band gap of the studied structures. While ZZnONr passivated with Mg for Zn-rich edge have not been shown a spin dependency, the structure passivated with Mg for O-rich edge have exhibited spin-dependent band structure. The energetically most stable structures have been determined as ZZnONr passivated with Mg for Zn-rich edge. ZZnONr passivated with Mg atoms for both edges have a graphene-like band structure especially for 8 and 10 atom width structures and this property of ZZnONrs could be important in terms of the electron transport for ZZnONrs.
Open Access
First-principles calculations of Pd-terminated symmetrical armchair graphene nanoribbons
(Elsevier, 2013) Kuloglu, A. F.; Sarikavak-Lisesivdin, B.; Lisesivdin, S. B.; Özbay, Ekmel
The effects of Palladium (Pd) termination on the electronic properties of armchair graphene nanoribbons (AGNRs) were calculated by using ab initio calculations. After a geometric optimization process, the electronic band structures, density of states, and binding energies of AGNRs with Na = 5-15 were calculated. Pd-termination was found to significantly influence the electronic properties of AGNRs. In DOS, many Q0D and Q1D type states were observed. Binding energy (BE) for single-side or both-side Pd-terminated structures represents characteristic drops with the increasing GNR width. With the increasing GNR width, the BEs of these structures become similar to hydrogenated structures. Because of the GNR width, dependent BE also gave information on the possible stiffness information, in which all of this information can be used in studies where controlled binding to graphene is required.
Open Access
Frequency and temperature dependence of the dielectric and AC electrical conductivity in (Ni/Au)/AlGaN/AlN/GaN heterostructures
(Elsevier, 2010) Arslan, E.; Şafak, Y.; Taşçioğlu, I.; Uslu, H.; Özbay, Ekmel
The dielectric properties and AC electrical conductivity (σ ac)of the (Ni/Au)/Al 0.22Ga 0.78N/AlN/GaN heterostructures, with and without the SiNx passivation, have been investigated by capacitance-voltage and conductance-voltage measurements in the wide frequency (5kHz-5 MHz) and temperature (80-400 K) range. The experimental values of the dielectric constant (ε'), dielectric loss (ε' '), loss tangent (tand), σ ac and the real and imaginary part of the electric modulus (M' and M' ') were found to be a strong function of frequency and temperature. A decrease in the values of ε' and ε' ' was observed, in which they both showed an increase in frequency and temperature. The values of M' and M' ' increase with increasing frequency and temperature. The σ ac increases with increasing frequency, while it decreases with increasing temperature. It can be concluded, therefore, that the interfacial polarization can occur more easily at low frequencies and temperatures with the number of interface states density located at the metal/semiconductor interface. It contributes to the e' and σ ac. © 2009 Elsevier B.V. All rights reserved.
Open Access
Gate bias characterization of CNT-TFT DNA sensors
(IEEE, 2009-12) Aktaş, Özgür; Töral, Taylan
This paper follows the approach in the works of Gui et al. (2007), that use the change in the current of carbon nanotube thin film transistors (CNT-TFT) with DNA attachment and DNA hybridization. The authors have studied the response of CNT-TFTs to DNA binding and hybridization. It was demonstrated for the first time that an increase in sensitivity is observed around the threshold voltage when sweeping the gate bias from negative to positive values. The results presented in this work suggest an improved approach to measuring the response of CNT-TFTs to DNA hybridization.
Open Access
Germanium for high performance MOSFETs and optical interconnects
(2008-10) Saraswat, K. C.; Kim, D.; Krishnamohan, T.; Kuzum, D.; Okyay, Ali Kemal; Pethe, A.; Yu H.-Y.
It is believed that to continue the scaling of silicon CMOS innovative device structures and new materials have to be created in order to continue the historic progress in information processing and transmission. Recently germanium has emerged as a viable candidate to augment Si for CMOS and optoelectronic applications. In this work we will first review recent results on growth of thin and thick films of Ge on Si, technology for appropriate cleaning of Ge, surface passivation using high-κ dielectrics, and metal induced crystallization of amorphous Ge and dopant activation. Next we will review application of Ge for high performance MOSFETs. Innovative Si/Ge MOS heterostructures will be described with high on current and low off currents. Finally we will describe optical detectors and modulators for on-chip and off-chip interconnect. Successful integration of Ge on Si should allow continued scaling of silicon CMOS to below 22 nm node. ©The Electrochemical Society.
Open Access
Gibbs free energy assisted passivation layers
(SPIE, 2016) Salihoğlu, Ömer; Tansel, T.; Hoştut, M.; Ergun, Y.; Aydınlı, Atilla
Reduction of surface leakage is a major challenge in most photodetectors that requires the elimination of surface oxides on etched mesas during passivation. Engineering the passivation requires close attention to chemical reactions that take place at the interface during the process. In particular, removal of surface oxides may be controlled via Gibbs reactivity. We have compared electrical performance of type-II superlattice photodetectors, designed for MWIR operation, passivated by different passivation techniques. We have used ALD deposited Al2O3, HfO2, TiO2, ZnO, PECVD deposited SiO2, Si3N4 and sulphur containing octadecanethiol (ODT) selfassembled monolayers (SAM) passivation layers on InAs/GaSb p-i-n superlattice photodetectors with cutoff wavelength at 5.1 μm. In this work, we have compared the result of different passivation techniques which are done under same conditions, same epitaxial structure and same fabrication processes. We have found that ALD deposited passivation is directly related to the Gibbs free energy of the passivation material. Gibbs free energies of the passivation layer can directly be compared with native surface oxides to check the effectiveness of the passivation layer before the experimental study.
Open Access
Investigation of angstrom-thick aluminium oxide passivation layers to improve the gate lag performance of GaN HEMTs
(IOP, 2019-07) Gülseren, Melisa Ekin; Kurt, Gökhan; Ulusoy Ghobadi, Türkan Gamze; Ghobadi, Amir; Salkım, Gurur; Öztürk, Mustafa; Bütün, Bayram; Özbay, Ekmel
In this paper, we report an angstrom-thick atomic layer deposited (ALD) aluminum oxide (Al2O3) dielectric passivation layer for an AlGaN/GaN high electron mobility transistor (HEMT). Our results show a 55% improvement in the gate lag performance of the design and a decrease by half in interface state density upon coating with two cycles of ALD Al2O3. DC characteristics such as current density, threshold voltage, and leakage currents were maintained. ALD Al2O3 passivation layers with thicknesses up to 10 nm were investigated. XPS analyses reveal that the first ALD cycles are sufficient to passivate GaN surface traps. This study demonstrates that efficient passivation can be achieved in atomic-scale with dimensions much thinner than commonly used bulk layers.
Open Access
Low dark current N structure superlattice MWIR photodetectors
(SPIE, 2014) Salihoğlu, O.; Muti, Abdullah; Turan, R.; Ergun, Y.; Aydınlı, Atilla
Commercially available read out integrated circuits (ROICs) require the FPA to have high dynamic resistance area product at zero bias (R0A) which is directly related to dark current of the detector. Dark current arises from bulk and surface contributions. Recent band structure engineering studies significantly suppressed the bulk contribution of the type-II superlattice infrared photodetectors (N structure, M structure, W structure). In this letter, we will present improved dark current results for unipolar barrier complex supercell superlattice system which is called as "N structure". The unique electronic band structure of the N structure increases electron-hole overlap under bias, significantly. N structure aims to improve absorption by manipulating electron and hole wavefunctions that are spatially separated in T2SLs, increasing the absorption while decreasing the dark current. In order to engineer the wavefunctions, we introduce a thin AlSb layer between InAs and GaSb layers in the growth direction which also acts as a unipolar electron barrier. Despite the difficulty of perfect lattice matching of InAs and AlSb, such a design is expected to reduce dark current. Experiments were carried out on Single pixel with mesa sizes of 100 × 100 - 700 × 700 μm photodiodes. Temperature dependent dark current with corresponding R0A resistance values are reported.
Open Access
Low-frequency noise behavior at reverse bias region in InAs/GaSb superlattice photodiodes on mid-wave infrared
(SPIE, 2013) Tansel, T.; Kutluer, K.; Muti, Abdullah; Salihoğlu, Ömer; Aydınlı, Atilla; Turan, R.
We describe a relationship between the noise characterization and activation energy of InAs/GaSb superlattice Mid- Wavelength-Infrared photodiodes for different passivation materials applied to the device. The noise measurements exhibited a frequency dependent plateau (i.e. 1/f-noise characteristic) for unpassivated as well as Si3N4 passivated samples whereas 1/f-type low noise suppression (i.e. frequency independent plateau) with a noise current reduction of more than one order of magnitude was observed for SiO2 passivation. For reverse bias values below -0.15V, the classical Schottky-noise calculation alone did not appear to describe the noise mechanism in a SL noise behavior, which shows a divergence between theoretically and experimentally determined noise values. We identify that, the additional noise appears, with and without passivation, at the surface activation energy of < 60 meV and is inversely proportional to the reverse bias. This is believed to be caused by the surface dangling-bonds (as well as surface states) whose response is controlled by the applied reverse bias. The calculated noise characteristics showed a good agreement with the experimental data. © 2013 SPIE.
Open Access
Low-loss regrowth-free long wavelength quantum cascade lasers
(Institute of Electrical and Electronics Engineers, 2018-12-01) Gündoğdu, Sinan; Demir, Abdullah; Pisheh, Hadi Sedaghat; Aydınlı, Atilla
Optical power output is the most sought-after quantity in laser engineering. This is also true for quantum cascade lasers operating especially at long wavelengths. Buried heterostructure cascade lasers with epitaxial regrowth have typically shown the lowest loss due to high current confinement as well as superior lateral thermal conductivity at the expense of complexity and cost. Among the many factors affecting optical output are the widely used passivating materials such as Si3N4 and SiO2. These materials have substantial optical absorption in the long wavelength infrared, which results in optical loss reducing the output of the laser. In this letter, we report on quantum cascade lasers with various waveguide widths and cavity lengths using both PECVD grown Si3N4 and e-beam evaporated HfO2 as passivating material on the same structure. Their slope efficiency was measured, and the cavity losses for the two lasers were calculated. We show that HfO2 passivated lasers have approximately 5.5 cm-1 lower cavity loss compared to Si3N4 passivated lasers. We observe up to 38% reduction in lasing threshold current, for lasers with HfO2 passivation. We model the losses of the cavity due to both insulator and metal contacts of the lasers using Comsol Multiphysics for various widths. We find that the loss due to absorption in the dielectric is a significant effect for Si3N4 passivated lasers and lasers in the 8-12-μm range may benefit from low loss passivation materials such as HfO2. Our results suggest that low-loss long wavelength quantum cascade lasers can be realized without epitaxial overgrowth.