Browsing by Author "Nayfeh, A."
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Item Open Access 2-nm laser-synthesized Si nanoparticles for low-power charge trapping memory devices(IEEE, 2014-08) El-Atab, N.; Özcan, Ayşe; Alkış, Sabri; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of embedding Silicon Nanoparticles (Si-NPs) in ZnO based charge trapping memory devices is studied. Si-NPs are fabricated by laser ablation of a silicon wafer in deionized water followed by sonication and filtration. The active layer of the memory was deposited by Atomic Layer Deposition (ALD) and spin coating technique was used to deliver the Si-NPs across the sample. The nanoparticles provided a good retention of charges (>10 years) in the memory cells and allowed for a large threshold voltage (Vt) shift (3.4 V) at reduced programming voltages (1 V). The addition of ZnO to the charge trapping media enhanced the electric field across the tunnel oxide and allowed for larger memory window at lower operating voltages. © 2014 IEEE.Item Open Access ∼3-nm ZnO nanoislands deposition and application in charge trapping memory grown by single ALD step(Nature Publishing Group, 2016) El-Atab, N.; Chowdhury F.; Ulusoy, T. G.; Ghobadi, A.; Nazirzadeh A.; Okyay, Ali Kemal; Nayfeh, A.Low-dimensional semiconductor nanostructures are of great interest in high performance electronic and photonic devices. ZnO is considered to be a multifunctional material due to its unique properties with potential in various applications. In this work, 3-nm ZnO nanoislands are deposited by Atomic Layer Deposition (ALD) and the electronic properties are characterized by UV-Vis-NIR Spectrophotometer and X-ray Photoelectron Spectroscopy. The results show that the nanostructures show quantum confinement effects in 1D. Moreover, Metal-Oxide-Semiconductor Capacitor (MOSCAP) charge trapping memory devices with ZnO nanoislands charge storage layer are fabricated by a single ALD step and their performances are analyzed. The devices showed a large memory window at low operating voltages with excellent retention and endurance characteristics due to the additional oxygen vacancies in the nanoislands and the deep barrier for the trapped holes due to the reduction in ZnO electron affinity. The results show that the ZnO nanoislands are promising in future low power memory applications. © The Author(s) 2016.Item Open Access Charge Trapping Memory with 2.85-nm Si-Nanoparticles Embedded in HfO2(ECS, 2015-05) El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of embedding 2.85-nm Si-nanoparticles charge trapping layer in between double layers of high-κ Al2O3/HfO2 oxides is studied. Using high frequency (1 MHz) C-Vgate measurements, the memory showed a large memory window at low program/erase voltages due to the charging of the Si-nanoparticles. The analysis of the C-V characteristics shows that mixed charges are being stored in the Si-nanoparticles where electrons get stored during the program operation while holes dominate in the Si-nanoparticles during the erase operation. Moreover, the retention characteristic of the memory is studied by measuring the memory hysteresis in time. The obtained retention characteristic (35.5% charge loss in 10 years) is due to the large conduction and valence band offsets between the Si-nanoparticles and the Al2O3/HfO2 tunnel oxide. The results show that band engineering is essential in future low-power non-volatile memory devices. In addition, the results show that Si-nanoparticles are promising in memory applications.Item Open Access Comparative study of thin film n-i-p a-Si: H solar cells to investigate the effect of absorber layer thickness on the plasmonic enhancement using gold nanoparticles(Elsevier Ltd, 2015) Islam, K.; Chowdhury F.I.; Okyay, Ali Kemal; Nayfeh, A.In this paper, the effect of gold nanoparticles on n-i-p a-Si:H solar cells with different intrinsic layer (i-layer) thicknesses has been studied. 100nm and 500nm i-layer based n-i-p a-Si:H solar cells were fabricated and colloidal gold (Au) nanoparticles dispersed in water-based solution were spin-coated on the top surface of the solar cells. The Au nanoparticles are of spherical shape and have 100nm diameter. Electrical and quantum efficiency measurements were carried out and the results show an increase in short-circuit current density (Jsc), efficiency and external quantum efficiency (EQE) with the incorporation of the nanoparticles on both cells. Jsc increases from 5.91mA/cm2 to 6.5mA/cm2 (~10% relative increase) and efficiency increases from 3.38% to 3.97% (~17.5% relative increase) for the 100nm i-layer solar cell after plasmonic enhancement whereas Jsc increases from 9.34mA/cm2 to 10.1mA/cm2 (~7.5% relative increase) and efficiency increases from 4.27% to 4.99% (~16.9% relative increase) for the 500nm i-layer cell. The results show that plasmonic enhancement is more effective in 100nm than 500nm i-layer thickness for a-Si:H solar cells. Moreover, the results are discussed in terms of light absorption and electron hole pair generation. © 2015 Elsevier Ltd.Item Open Access Corrigendum: Enhancement of polycrystalline silicon solar cells efficiency using indium nitride particles (2015 J. Opt. 17 105903)(IOP, 2019) Alkış, Sabri; Chowdhury, F. I.; Alevli, M.; Dietz, N.; Yalızay, D.; Aktürk, S.; Nayfeh, A.; Okyay, Ali KemalIn this work, we present a hybrid indium nitride particle/polycrystalline silicon solar cell based on 230 nm size indium nitride particles (InN-Ps) obtained through laser ablation. The solar cell performance measurements indicate that there is an absolute 1.5% increase (Δη) in the overall solar cell efficiency due to the presence of InN-Ps. Within the spectral range 300–1100 nm, improvements of up to 8.26% are observed in the external quantum efficiency (EQE) and increases of up to 8.75% are observed in the internal quantum efficiency (IQE) values of the corresponding solar cell. The enhancement in power performance is due to the down-shifting properties of the InN-Ps. The electrical measurements are supplemented by TEM, Raman, UV/VIS and PL spectroscopy of the InN-Ps.Item Open Access Cubic-phase zirconia nano-island growth using atomic layer deposition and application in low-power charge-trapping nonvolatile-memory devices(Institute of Physics Publishing Ltd., 2017) El-Atab, N.; Ulusoy, T. G.; Ghobadi, A.; Suh, J.; Islam, R.; Okyay, Ali Kemal; Saraswat, K.; Nayfeh, A.The manipulation of matter at the nanoscale enables the generation of properties in a material that would otherwise be challenging or impossible to realize in the bulk state. Here, we demonstrate growth of zirconia nano-islands using atomic layer deposition on different substrate terminations. Transmission electron microscopy and Raman measurements indicate that the nano-islands consist of nano-crystallites of the cubic-crystalline phase, which results in a higher dielectric constant (κ ∼ 35) than the amorphous phase case (κ ∼ 20). X-ray photoelectron spectroscopy measurements show that a deep quantum well is formed in the Al2O3/ZrO2/Al2O3 system, which is substantially different to that in the bulk state of zirconia and is more favorable for memory application. Finally, a memory device with a ZrO2 nano-island charge-trapping layer is fabricated, and a wide memory window of 4.5 V is obtained at a low programming voltage of 5 V due to the large dielectric constant of the islands in addition to excellent endurance and retention characteristics.Item Open Access Diode behavior in ultra-thin low temperature ALD grown zinc-oxide on silicon(AIP Publishing, 2013) El-Atab, N.; Alqatari, S.; Oruc F.B.; Souier, T.; Chiesa, M.; Okyay, Ali Kemal; Nayfeh, A.A thin-film ZnO(n)/Si(p+) heterojunction diode is demonstrated. The thin film ZnO layer is deposited by Atomic Layer Deposition (ALD) at different temperatures on a p-type silicon substrate. Atomic force microscopy (AFM) AC-in-Air method in addition to conductive AFM (CAFM) were used for the characterization of ZnO layer and to measure the current-voltage characteristics. Forward and reverse bias n-p diode behavior with good rectification properties is achieved. The diode with ZnO grown at 80°C exhibited the highest on/off ratio with a turn-on voltage (VON) ∼3.5 V. The measured breakdown voltage (VBR) and electric field (EBR) for this diode are 5.4 V and 3.86 MV/cm, respectively. © 2013 © 2013 Author(s).Item Open Access Effect of gold nanoparticles size on light scattering for thin film amorphous-silicon solar cells(Elsevier Ltd, 2014-05) Islam, K.; Alnuaimi, A.; Battal, E.; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of gold (Au) nanoparticles on the performance of a-Si:H solar cells is investigated experimentally. The solar cell stack is grown on a highly doped p-type Si wafer and consists of 20nm heavily doped p-type a-Si, 500nm undoped a-Si, 20nm heavily doped n-type a-Si and finally 80nm Indium Tin Oxide (ITO) on the top. Au nanoparticles of 10, 20, 50, 80, 100, 200 and 400nm are spin coated on top of the ITO before metallization. The plasmonic effect of the Au nanoparticles allows for additional scattering at the surface thus reducing the overall reflectivity. The larger the nanoparticle size the more scattering is obtained and the median reflectivity drops from about 23% to 18%. The results show an increase in the short-circuit current density (Jsc) and efficiency with increasing nanoparticle size. The Jsc increases from 9.34 to 10.1mA/cm2. In addition, the efficiency increases from 4.28% to 5.01%. © 2014 Elsevier Ltd.Item Open Access Enhanced light scattering with energy downshifting using 16 nm indium nitride nanoparticles for improved thin-film a-Si N-i-P solar cells(Electrochemical Society Inc., 2015-05) Chowdhury F.I.; İslam, K.; Alkış, Sabri; Ortaç, Bülend; Alevli, Mustafa; Dietz, N.; Okyay, Ali Kemal; Nayfeh, A.In this work the effect of Indium nitride (InN) nanoparticles (NPs) on the performance of a-Si: H solar cells has been investigated. The average Jsc of InN NPs coated cells was found 6.76 mA/cm2 which is 16.69% higher than the average Jsc of the reference cell which was 5.79 mA/cm2. Average efficiency of InN NPs coated cells showed 14.16% increase from 3.32% to 3.79%. Peak EQE has increased from 44.8% at 500 nm to 51.67% at 510 nm and peak IQE has increased from 51.70% at 510 nm to 68.38% at 500 nm for InN NPs coated cell. Further study shows that EQE change is larger between 510 nm-700 nm compared to IQE change indicting a surface scattering mechanism that reduces the reflectivity. However, between 400 nm-510 nm IQE change is larger than EQE change which indicates that energy downshifting mechanism is dominating. So overall performance enhancement can be attributed to the scattering and photoluminescence properties of InN NPs that enhances absorption inside a-Si: H solar cells. © The Electrochemical Society.Item Open Access Enhanced memory effect via quantum confinement in 16 nm InN nanoparticles embedded in ZnO charge trapping layer(AIP Publishing, 2014) El-Atab, N.; Cimen, F.; Alkis, S.; Ortac, B.; Alevli, M.; Dietz, N.; Okyay, Ali Kemal; Nayfeh, A.In this work, the fabrication of charge trapping memory cells with laser-synthesized indium-nitride nanoparticles (InN-NPs) embedded in ZnO charge trapping layer is demonstrated. Atomic layer deposited Al2O3 layers are used as tunnel and blocking oxides. The gate contacts are sputtered using a shadow mask which eliminates the need for any lithography steps. High frequency C-Vgate measurements show that a memory effect is observed, due to the charging of the InN-NPs. With a low operating voltage of 4 V, the memory shows a noticeable threshold voltage (Vt) shift of 2 V, which indicates that InN-NPs act as charge trapping centers. Without InN-NPs, the observed memory hysteresis is negligible. At higher programming voltages of 10 V, a memory window of 5 V is achieved and the Vt shift direction indicates that electrons tunnel from channel to charge storage layer. © 2014 AIP Publishing LLCItem Open Access Enhanced memory effect with embedded graphene nanoplatelets in ZnO charge trapping layer(AIP Publishing, 2014) El Atab, B.; Cimen, F.; Alkis, S.; Okyay, Ali Kemal; Nayfeh, A.A charge trapping memory with graphene nanoplatelets embedded in atomic layer deposited ZnO (GNIZ) is demonstrated. The memory shows a large threshold voltage Vt shift (4 V) at low operating voltage (6/-6 V), good retention (>10 yr), and good endurance characteristic (>104 cycles). This memory performance is compared to control devices with graphene nanoplatelets (or ZnO) and a thicker tunnel oxide. These structures showed a reduced Vt shift and retention characteristic. The GNIZ structure allows for scaling down the tunnel oxide thickness along with improving the memory window and retention of data. The larger Vt shift indicates that the ZnO adds available trap states and enhances the emission and retention of charges. The charge emission mechanism in the memory structures with graphene nanoplatelets at an electric field E ¥ 5.57 MV/cm is found to be based on Fowler-Nordheim tunneling. The fabrication of this memory device is compatible with current semiconductor processing, therefore, has great potential in low-cost nano-memory applications. © 2014 AIP Publishing LLC.Item Open Access Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide(Springer New York LLC, 2015) El-Atab, N.; Turgut, B. B.; Okyay, Ali Kemal; Nayfeh, M.; Nayfeh, A.In this work, we demonstrate a non-volatile metal-oxide semiconductor (MOS) memory with Quattro-layer graphene nanoplatelets as charge storage layer with asymmetric Al2O3/HfO2 tunnel oxide and we compare it to the same memory structure with 2.85-nm Si nanoparticles charge trapping layer. The results show that graphene nanoplatelets with Al2O3/HfO2 tunnel oxide allow for larger memory windows at the same operating voltages, enhanced retention, and endurance characteristics. The measurements are further confirmed by plotting the energy band diagram of the structures, calculating the quantum tunneling probabilities, and analyzing the charge transport mechanism. Also, the required program time of the memory with ultra-thin asymmetric Al2O3/HfO2 tunnel oxide with graphene nanoplatelets storage layer is calculated under Fowler-Nordheim tunneling regime and found to be 4.1 ns making it the fastest fully programmed MOS memory due to the observed pure electrons storage in the graphene nanoplatelets. With Si nanoparticles, however, the program time is larger due to the mixed charge storage. The results confirm that band-engineering of both tunnel oxide and charge trapping layer is required to enhance the current non-volatile memory characteristics.Item Open Access Enhancement in c-Si solar cells using 16 nm InN nanoparticles(IOP Publishing, 2016-05) Chowdhury, F. I.; Alnuaimi, A.; Alkis, S.; Ortaç, B.; Aktürk, S.; Alevli, M.; Dietz, N.; Okyay, Ali Kemal; Nayfeh, A.In this work, 16 nm indium nitride (InN) nanoparticles (NPs) are used to increase the performance of thin-film c-Si HIT solar cells. InN NPs were spin-coated on top of an ITO layer of c-Si HIT solar cells. The c-Si HIT cell is a stack of 2 μm p type c-Si, 4–5 nm n type a-Si, 15 nm n+ type a-Si and 80 nm ITO grown on a p+ type Si substrate. On average, short circuit current density (Jsc) increases from 19.64 mA cm−2 to 21.54 mA cm−2 with a relative improvement of 9.67% and efficiency increases from 6.09% to 7.09% with a relative improvement of 16.42% due to the presence of InN NPs. Reflectance and internal/external quantum efficiency (IQE/EQE) of the devices were also measured. Peak EQE was found to increase from 74.1% to 81.3% and peak IQE increased from 93% to 98.6% for InN NPs coated c-Si HIT cells. Lower reflection of light due to light scattering is responsible for performance enhancement between 400–620 nm while downshifted photons are responsible for performance enhancement from 620 nm onwards.Item Open Access Enhancement of polycrystalline silicon solar cells efficiency using indium nitride particles(Institute of Physics Publishing Ltd., 2015) Alkis, S.; Chowdhury, F. I.; Alevli, M.; Dietz, N.; Yalızay, B.; Aktürk, S.; Nayfeh, A.; Okyay, Ali KemalIn this work, we present a hybrid indium nitride particle/polycrystalline silicon solar cell based on 230 nm size indium nitride particles (InN-Ps) obtained through laser ablation. The solar cell performance measurements indicate that there is an absolute 1.5% increase (Δη) in the overall solar cell efficiency due to the presence of InN-Ps. Within the spectral range 300-1100 nm, improvements of up to 8.26% are observed in the external quantum efficiency (EQE) and increases of up to 8.75% are observed in the internal quantum efficiency (IQE) values of the corresponding solar cell. The enhancement in power performance is due to the down-shifting properties of the InN-Ps. The electrical measurements are supplemented by TEM, Raman, UV/VIS and PL spectroscopy of the InN-Ps. © 2015 IOP Publishing Ltd.Item Open Access Graphene Nanoplatelets Embedded in HfO2 for MOS Memory(Electrochemical Society Inc., 2015) El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali Kemal; Nayfeh, A.In this work, a MOS memory with graphene nanoplatelets charge trapping layer and a double layer high-κ Al2O3/HfO2 tunnel oxide is demonstrated. Using C-Vgate measurements, the memory showed a large memory window at low program/erase voltages. The analysis of the C-V characteristics shows that electrons are being stored in the graphene-nanoplatelets during the program operation. In addition, the retention characteristic of the memory is studied by plotting the hysteresis measurement vs. time. The measured excellent retention characteristic (28.8% charge loss in 10 years) is due to the large electron affinity of the graphene. The analysis of the plot of the energy band diagram of the MOS structure further proves its good retention characteristic. Finally, the results show that such graphene nanoplatelets are promising in future low-power non-volatile memory devices.Item Open Access Growth of ∼3-nm ZnO nano-islands using Atomic layer deposition(IEEE, 2016) El-Atab, N.; Chowdhury, F. I.; Ulusoy, Türkan Gamze; Ghobadi, Amir; Nazirzadeh, Amin; Okyay, Ali Kemal; Nayfeh, A.In this work, the deposition of 3-nm dispersed Zinc-Oxide (ZnO) nanislands by thermal Atomic Layer Deposition (ALD) is demonstrated. The physical and electronic properties of the islands are studied using Atomic Force Microscopy, UV-Vis-NIR spectroscopy, and X-ray Photoelectron Spectroscopy. The results show that there is quantum confinement in 1D in the nanoislands which is manifested by the increase of the bandgap and the reduction of the electron affinity of the ZnO islands. The results are promising for the fabrication of future electronic and optoelectronic devices by single ALD step.Item Open Access Improved efficiency of thin film a-Si:H solar cells with Au nanoparticles(Institute of Electrical and Electronics Engineers Inc., 2013) Islam, K.; Alnuaimi, A.; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of Au nanoparticles on the performance of a-Si:H solar cells is investigated experimentally. Au nanoparticles of 10, 20, 50, 80, 100, 200 and 400 nm are spin coated on ITO before metallization. The results show an increase in the Jsc and efficiency with increasing nanoparticle size. The Jsc increases from 9.34 mA/cm2 to 10.1 mA/cm2. In addition, the efficiency increases from 4.28% to 5.01%. © 2013 IEEE.Item Open Access Low power Zinc-Oxide based charge trapping memory with embedded silicon nanoparticles(ECS, 2014) Nayfeh, A.; Okyay, Ali Kemal; El-Atab, N.; Özcan, Ayşe; Alkış, SabriIn this work, a bottom-gate charge trapping memory device with Zinc-Oxide (ZnO) channel and 2-nm Si nanoparticles (Si-NPs) embedded in ZnO charge trapping layer is demonstrated. The active layers of the memory device are deposited by atomic layer deposition (ALD) and the Si-NPs are deposited by spin coating. The Si-NPs memory exhibits a threshold voltage (Vt) shift of 6.3 V at an operating voltage of -10/10 V while 2.6 V Vt shift is obtained without nanoparticles confirming that the Si-NPs act as energy states within the bandgap of the ZnO layer. In addition, a 3.4 V Vt is achieved at a very low operating voltage of -1 V/1 V due to the charging of the Si-NPs through Poole-Frenkel emission mechanism at an electric field across the tunnel oxide E > 0.36 MV/cm. The results highlight a promising technology for future ultra-low power memory devices.Item Open Access Low power zinc-oxide based charge trapping memory with embedded silicon nanoparticles via poole-frenkel hole emission(2014) El-Atab, N.; Ozcan, A.; Alkis, S.; Okyay, Ali Kemal; Nayfeh, A.A low power zinc-oxide (ZnO) charge trapping memory with embedded silicon (Si) nanoparticles is demonstrated. The charge trapping layer is formed by spin coating 2 nm silicon nanoparticles between Atomic Layer Deposited ZnO steps. The threshold voltage shift (ΔVt) vs. programming voltage is studied with and without the silicon nanoparticles. Applying -1 V for 5 s at the gate of the memory with nanoparticles results in a ΔVt of 3.4 V, and the memory window can be up to 8 V with an excellent retention characteristic (>10 yr). Without nanoparticles, at -1 V programming voltage, the ΔVt is negligible. In order to get ΔVt of 3.4 V without nanoparticles, programming voltage in excess of 10 V is required. The negative voltage on the gate programs the memory indicating that holes are being trapped in the charge trapping layer. In addition, at 1 V the electric field across the 3.6 nm tunnel oxide is calculated to be 0.36 MV/cm, which is too small for significant tunneling. Moreover, the ΔVt vs. electric field across the tunnel oxide shows square root dependence at low fields (E 1 MV/cm) and a square dependence at higher fields (E > 2.7 MV/cm). This indicates that Poole-Frenkel Effect is the main mechanism for holes emission at low fields and Phonon Assisted Tunneling at higher fields. © 2014 AIP Publishing LLC.Item Open Access Memory effect by charging of ultra‐small 2‐nm laser‐synthesized solution processable Si‐nanoparticles embedded in Si–Al2O3–SiO2 structure(Wiley-VCH Verlag, 2015) El-Atab, N.; Rizk, A.; Tekcan, B.; Alkis, S.; Okyay, Ali Kemal; Nayfeh, A.A memory structure containing ultra-small 2-nm laser-synthesized silicon nanoparticles is demonstrated. The Si-nanoparticles are embedded between an atomic layer deposited high-κ dielectric Al2O3 layer and a sputtered SiO2 layer. A memory effect due to charging of the Si nanoparticles is observed using high frequency C-V measurements. The shift of the threshold voltage obtained from the hysteresis measurements is around 3.3V at 10/-10V gate voltage sweeping. The analysis of the energy band diagram of the memory structure and the negative shift of the programmed C-V curve indicate that holes are tunneling from p-type Si via Fowler-Nordheim tunneling and are being trapped in the Si nanoparticles. In addition, the structures show good endurance characteristic (>105program/erase cycles) and long retention time (>10 years), which make them promising for applications in non-volatile memory devices. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.