TiO2 thin film transistor by atomic layer deposition
buir.contributor.author | Okyay, Ali Kemal | |
dc.citation.volumeNumber | 8626 | en_US |
dc.contributor.author | Okyay, Ali Kemal | en_US |
dc.contributor.author | Oruç, Feyza B. | en_US |
dc.contributor.author | Çimen, Furkan | en_US |
dc.contributor.author | Aygün, Levent E. | en_US |
dc.coverage.spatial | San Francisco, California, United States | en_US |
dc.date.accessioned | 2016-02-08T12:08:17Z | |
dc.date.available | 2016-02-08T12:08:17Z | |
dc.date.issued | 2013 | en_US |
dc.department | Department of Electrical and Electronics Engineering | en_US |
dc.department | Institute of Materials Science and Nanotechnology (UNAM) | en_US |
dc.description | Date of Conference: 3–6 February 2013 | en_US |
dc.description | Conference name: Proceedings of SPIE, Oxide-based Materials and Devices IV | en_US |
dc.description.abstract | In this study, TiO2 films were deposited using thermal Atomic Layer Deposition (ALD) system. It is observed that asdeposited ALD TiO 2 films are amorphous and not suitable as TFT channel material. In order to use the film as channel material, a post-annealing process is needed. Annealed films transform into a polycrystalline form containing mixed anatase and rutile phases. For this purpose, devices are annealed at 475°C and observed that their threshold voltage value is 6.5V, subthreshold slope is 0.35 V/dec, Ion/Ioff ratios 2.5×106 and mobility value is 0.672 cm2/V.s. Optical response measurements showed that devices exhibits decent performance at ultraviolet region where TiO 2 has band to band absorption mechanism. © 2013 SPIE. | en_US |
dc.description.provenance | Made available in DSpace on 2016-02-08T12:08:17Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 70227 bytes, checksum: 26e812c6f5156f83f0e77b261a471b5a (MD5) Previous issue date: 2013 | en |
dc.identifier.doi | 10.1117/12.2005528 | en_US |
dc.identifier.issn | 0277-786X | |
dc.identifier.uri | http://hdl.handle.net/11693/28011 | |
dc.language.iso | English | en_US |
dc.publisher | SPIE | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1117/12.2005528 | en_US |
dc.source.title | Proceedings of SPIE | en_US |
dc.subject | Atomic Layer Deposition | en_US |
dc.subject | Thin Film Transistors | en_US |
dc.subject | Titanium Dioxide | en_US |
dc.subject | Transparent Electronics | en_US |
dc.subject | Absorption mechanisms | en_US |
dc.subject | Channel materials | en_US |
dc.subject | Optical response | en_US |
dc.subject | Polycrystalline | en_US |
dc.subject | Post annealing | en_US |
dc.subject | Subthreshold slope | en_US |
dc.subject | Transparent electronics | en_US |
dc.subject | Ultraviolet region | en_US |
dc.subject | Amorphous films | en_US |
dc.subject | Amorphous materials | en_US |
dc.subject | Deposition | en_US |
dc.subject | Oxide minerals | en_US |
dc.subject | Thin film transistors | en_US |
dc.subject | Titanium dioxide | en_US |
dc.subject | Atomic layer deposition | en_US |
dc.title | TiO2 thin film transistor by atomic layer deposition | en_US |
dc.type | Conference Paper | en_US |
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