Controlled growth and characterization of epitaxially-laterally-overgrown InGaN/GaN quantum heterostructures

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Abstract

Crystal material quality is fundamentally important for optoelectronic devices including laser diodes and light emitting diodes. To this end epitaxial lateral overgrowth (ELO) has proven to be a powerful technique for reducing dislocation density in GaN and its alloys [1,2]. Implementation and design of ELO process is, however, critical for obtaining high-quality material with high-efficiency quantum structures for light emitters [3]. ©2010 IEEE.

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2010 23rd Annual Meeting of the IEEE Photonics Society

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IEEE

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Published Version (Please cite this version)

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English