Preparation of Al 2O 3and AlN nanotubes by atomic layer deposition

buir.contributor.authorBıyıklı, Necmi
buir.contributor.orcidUyar, Tamer|0000-0002-3989-4481
dc.citation.epage138en_US
dc.citation.spage133en_US
dc.citation.volumeNumber1408en_US
dc.contributor.authorOzgit-Akgun, Çaglaen_US
dc.contributor.authorKayacı, Fatmaen_US
dc.contributor.authorDönmez, İncien_US
dc.contributor.authorÇağatay, Enginen_US
dc.contributor.authorUyar, Tameren_US
dc.contributor.authorBıyıklı, Necmien_US
dc.coverage.spatialBoston, Massachusetts, USAen_US
dc.date.accessioned2016-02-08T12:13:02Z
dc.date.available2016-02-08T12:13:02Z
dc.date.issued2012en_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.descriptionConference name: Materials Research Society Symposium (MRS) Proceedings, 2011 Materials Research Society (MRS) Fall Meeting & Exhibit,en_US
dc.descriptionDate of Conference: November 28-December 2, 2011en_US
dc.description.abstractAl 2O 3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H 2O), and ammonia (NH 3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al 2O 3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al 2O 3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses. © 2012 Materials Research Society.en_US
dc.identifier.doi10.1557/opl.2012.38en_US
dc.identifier.issn0272-9172
dc.identifier.urihttp://hdl.handle.net/11693/28169
dc.language.isoEnglishen_US
dc.publisherCambridge University Pressen_US
dc.relation.isversionofhttp://dx.doi.org/10.1557/opl.2012.38en_US
dc.source.titleMaterials Research Society Symposium Proceedingsen_US
dc.subjectAlNen_US
dc.subjectElectrospunsen_US
dc.subjectHigh-resolution TEMen_US
dc.subjectNylon 66en_US
dc.subjectOrganic componentsen_US
dc.subjectPolycrystallineen_US
dc.subjectSelected area electron diffractionen_US
dc.subjectTEM imagesen_US
dc.subjectTransmission electron microscopy temen_US
dc.subjectTrimethylaluminumen_US
dc.subjectWall thicknessen_US
dc.subjectAluminumen_US
dc.subjectAluminum nitrideen_US
dc.subjectAtomic layer depositionen_US
dc.subjectDepositionen_US
dc.subjectElectron diffractionen_US
dc.subjectNanofibersen_US
dc.subjectNanowiresen_US
dc.subjectPhotoelectronsen_US
dc.subjectScanning electron microscopyen_US
dc.subjectTransmission electron microscopyen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectNanotubesen_US
dc.titlePreparation of Al 2O 3and AlN nanotubes by atomic layer depositionen_US
dc.typeConference Paperen_US

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