Preparation of Al 2O 3and AlN nanotubes by atomic layer deposition

Date
2012
Advisor
Instructor
Source Title
Materials Research Society Symposium Proceedings
Print ISSN
0272-9172
Electronic ISSN
Publisher
Cambridge University Press
Volume
1408
Issue
Pages
133 - 138
Language
English
Type
Conference Paper
Journal Title
Journal ISSN
Volume Title
Abstract

Al 2O 3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H 2O), and ammonia (NH 3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al 2O 3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al 2O 3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses. © 2012 Materials Research Society.

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Other identifiers
Book Title
Keywords
AlN, Electrospuns, High-resolution TEM, Nylon 66, Organic components, Polycrystalline, Selected area electron diffraction, TEM images, Transmission electron microscopy tem, Trimethylaluminum, Wall thickness, Aluminum, Aluminum nitride, Atomic layer deposition, Deposition, Electron diffraction, Nanofibers, Nanowires, Photoelectrons, Scanning electron microscopy, Transmission electron microscopy, X ray photoelectron spectroscopy, Nanotubes
Citation
Published Version (Please cite this version)