Investigation of thin films SiO2 obtained by low temperature plasmachemical deposition
Date
1994-07-26
Editor(s)
Advisor
Supervisor
Co-Advisor
Co-Supervisor
Instructor
Source Title
Soviet Technical Physics Letters
= Письма в Журнал Tехнической Физики
Print ISSN
0360-120X
Electronic ISSN
Publisher
American Institute of Physics
Volume
20
Issue
14
Pages
51 - 56
Language
Russian
Type
Journal Title
Journal ISSN
Volume Title
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