Investigation of thin films SiO2 obtained by low temperature plasmachemical deposition

Date

1994-07-26

Authors

Timofeev, F. N.
Bozkurt, K.
Gure, M.
Aydınlı, Atilla
Süzer, Şefik
Ellialtioglu, R.
Turkoglu, K.

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Abstract

Source Title

Soviet Technical Physics Letters = Письма в Журнал Tехнической Физики

Publisher

American Institute of Physics

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Citation

Published Version (Please cite this version)

Language

Russian