Lithography-free metamaterial absorbers: Opinion

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buir.contributor.authorGhobadi, Amir
buir.contributor.authorUlusoy Ghobadi, Türkan Gamze
buir.contributor.authorÖzbay, Ekmel
buir.contributor.orcidGhobadi, Amir|0000-0002-8146-0361
buir.contributor.orcidUlusoy Ghobadi, Türkan Gamze|0000-0002-7669-1587
dc.citation.epage532en_US
dc.citation.issueNumber2en_US
dc.citation.spage524en_US
dc.citation.volumeNumber12en_US
dc.contributor.authorGhobadi, Amir
dc.contributor.authorUlusoy Ghobadi, Türkan Gamze
dc.contributor.authorÖzbay, Ekmel
dc.date.accessioned2023-02-28T07:16:04Z
dc.date.available2023-02-28T07:16:04Z
dc.date.issued2022-02-01
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentDepartment of Physicsen_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.departmentNanotechnology Research Center (NANOTAM)en_US
dc.description.abstractAlthough advancement in nanofabrication provides the opportunity to realize nanoscale geometries with high resolutions, the scalability and repeatability issues limit their large-scale applications. Lithography-free metamaterial absorbers (LFMAs) are a potential route for the upscaling of these designs. With restricted freedom in their synthesis, the importance of the proper material choice is emphasized. Herein, we provide a comprehensive overview of the recently developed LFMAs, from both design and material perspectives, while considering their most promising applications. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreementen_US
dc.description.provenanceSubmitted by Cem Çağatay Akgün (cem.akgun@bilkent.edu.tr) on 2023-02-28T07:16:04Z No. of bitstreams: 1 Lithography_free_metamaterial_absorbers_opinion.pdf: 2701898 bytes, checksum: 5de9eee113cd9786e51bf34cce1f1269 (MD5)en
dc.description.provenanceMade available in DSpace on 2023-02-28T07:16:04Z (GMT). No. of bitstreams: 1 Lithography_free_metamaterial_absorbers_opinion.pdf: 2701898 bytes, checksum: 5de9eee113cd9786e51bf34cce1f1269 (MD5) Previous issue date: 2022-02-01en
dc.identifier.doi10.1364/OME.448363en_US
dc.identifier.issn21593930
dc.identifier.urihttp://hdl.handle.net/11693/111877
dc.language.isoEnglishen_US
dc.publisherThe Optical Societyen_US
dc.relation.isversionofhttps://dx.doi.org/10.1364/OME.448363en_US
dc.source.titleOptical Materials Expressen_US
dc.subjectLithographyen_US
dc.subjectNanotechnologyen_US
dc.titleLithography-free metamaterial absorbers: Opinionen_US
dc.typeArticleen_US

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