Lithography-free metamaterial absorbers: Opinion

Date
2022-02-01
Advisor
Instructor
Source Title
Optical Materials Express
Print ISSN
21593930
Electronic ISSN
Publisher
The Optical Society
Volume
12
Issue
2
Pages
524 - 532
Language
English
Type
Article
Journal Title
Journal ISSN
Volume Title
Abstract

Although advancement in nanofabrication provides the opportunity to realize nanoscale geometries with high resolutions, the scalability and repeatability issues limit their large-scale applications. Lithography-free metamaterial absorbers (LFMAs) are a potential route for the upscaling of these designs. With restricted freedom in their synthesis, the importance of the proper material choice is emphasized. Herein, we provide a comprehensive overview of the recently developed LFMAs, from both design and material perspectives, while considering their most promising applications. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement

Course
Other identifiers
Book Title
Keywords
Lithography, Nanotechnology
Citation
Published Version (Please cite this version)