Lithography-free metamaterial absorbers: Opinion
Date
2022-02-01
Editor(s)
Advisor
Supervisor
Co-Advisor
Co-Supervisor
Instructor
BUIR Usage Stats
3
views
views
36
downloads
downloads
Citation Stats
Series
Abstract
Although advancement in nanofabrication provides the opportunity to realize nanoscale geometries with high resolutions, the scalability and repeatability issues limit their large-scale applications. Lithography-free metamaterial absorbers (LFMAs) are a potential route for the upscaling of these designs. With restricted freedom in their synthesis, the importance of the proper material choice is emphasized. Herein, we provide a comprehensive overview of the recently developed LFMAs, from both design and material perspectives, while considering their most promising applications. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
Source Title
Optical Materials Express
Publisher
The Optical Society
Course
Other identifiers
Book Title
Keywords
Degree Discipline
Degree Level
Degree Name
Citation
Permalink
Published Version (Please cite this version)
Language
English