Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications

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buir.contributor.authorOkyay, Ali Kemal
dc.citation.issueNumber2en_US
dc.citation.volumeNumber35en_US
dc.contributor.authorTilkioğlu, Bilge T.en_US
dc.contributor.authorBolat, Samien_US
dc.contributor.authorTanrıkulu, Mahmud Yusufen_US
dc.contributor.authorOkyay, Ali Kemalen_US
dc.date.accessioned2018-04-12T11:02:14Z
dc.date.available2018-04-12T11:02:14Z
dc.date.issued2017en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractThe authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 °C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of −5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 °C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. © 2017 American Vacuum Society.en_US
dc.identifier.doi10.1116/1.4976513en_US
dc.identifier.issn0734-2101
dc.identifier.urihttp://hdl.handle.net/11693/37077
dc.language.isoEnglishen_US
dc.publisherAVS Science and Technology Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.4976513en_US
dc.source.titleJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Filmsen_US
dc.subjectAtomic layer depositionen_US
dc.subjectBolometersen_US
dc.subjectTemperatureen_US
dc.subjectTemperature sensorsen_US
dc.subjectThermistorsen_US
dc.subjectThin filmsen_US
dc.subjectTitanium dioxideen_US
dc.subjectZinc oxideen_US
dc.subjectCrystallinitiesen_US
dc.subjectDigital alloyingen_US
dc.subjectMaximum temperatureen_US
dc.subjectMicro-bolometersen_US
dc.subjectOperation temperatureen_US
dc.subjectTemperature-insensitiveen_US
dc.subjectThin film thermistoren_US
dc.subjectUncooled microbolometersen_US
dc.subjectDepositionen_US
dc.titleDigitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applicationsen_US
dc.typeArticleen_US

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Institute of Materials Science and Nanotechnology (UNAM)