Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
Date
2017
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Abstract
The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 °C. Crystallinity of the material is shown to be degraded with the increase of the Ti content in the grown film. A maximum temperature coefficient of resistance (TCR) of −5.96%/K is obtained with the films containing 12.2 at. % Ti, and the obtained TCR value is shown to be temperature insensitive in the 15-22 °C, thereby allowing a wide range of operation temperatures for the low cost microbolometers. © 2017 American Vacuum Society.
Source Title
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publisher
AVS Science and Technology Society
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Keywords
Atomic layer deposition, Bolometers, Temperature, Temperature sensors, Thermistors, Thin films, Titanium dioxide, Zinc oxide, Crystallinities, Digital alloying, Maximum temperature, Micro-bolometers, Operation temperature, Temperature-insensitive, Thin film thermistor, Uncooled microbolometers, Deposition
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Language
English