InGaN/GaN light-emitting diode with a polarization tunnel junction
buir.contributor.author | Demir, Hilmi Volkan | |
buir.contributor.orcid | Demir, Hilmi Volkan|0000-0003-1793-112X | |
dc.citation.epage | 193508-5 | en_US |
dc.citation.issueNumber | 19 | en_US |
dc.citation.spage | 193508-1 | en_US |
dc.citation.volumeNumber | 102 | en_US |
dc.contributor.author | Zhang Z.-H. | en_US |
dc.contributor.author | Tan S.T. | en_US |
dc.contributor.author | Kyaw, Z. | en_US |
dc.contributor.author | Ji Y. | en_US |
dc.contributor.author | Liu W. | en_US |
dc.contributor.author | Ju, Z. | en_US |
dc.contributor.author | Hasanov N. | en_US |
dc.contributor.author | Sun, X. W. | en_US |
dc.contributor.author | Demir, Hilmi Volkan | en_US |
dc.date.accessioned | 2015-07-28T12:00:12Z | |
dc.date.available | 2015-07-28T12:00:12Z | |
dc.date.issued | 2013 | en_US |
dc.department | Department of Physics | en_US |
dc.department | Department of Electrical and Electronics Engineering | en_US |
dc.department | Institute of Materials Science and Nanotechnology (UNAM) | en_US |
dc.description.abstract | We report InGaN/GaN light-emitting diodes (LED) comprising in situ integrated p(+)-GaN/InGaN/n(+)-GaN polarization tunnel junctions. Improved current spreading and carrier tunneling probability were obtained in the proposed device architecture, leading to the enhanced optical output power and external quantum efficiency. Compared to the reference InGaN/GaN LEDs using the conventional p(+)/n(+) tunnel junction, these devices having the polarization tunnel junction show a reduced forward bias, which is attributed to the polarization induced electric fields resulting from the in-plane biaxial compressive strain in the thin InGaN layer sandwiched between the p(+)-GaN and n(+)-GaN layers. (C) 2013 AIP Publishing LLC. | en_US |
dc.description.provenance | Made available in DSpace on 2015-07-28T12:00:12Z (GMT). No. of bitstreams: 1 10.1063-1.4806978.pdf: 1335917 bytes, checksum: c826dadaedd73e8053de8cbda20578fe (MD5) | en |
dc.identifier.doi | 10.1063/1.4806978 | en_US |
dc.identifier.issn | 0003-6951 | |
dc.identifier.uri | http://hdl.handle.net/11693/12130 | |
dc.language.iso | English | en_US |
dc.publisher | American Institute of Physics | en_US |
dc.relation.isversionof | http://dx.doi.org/ 10.1063/1.4806978 | en_US |
dc.source.title | Applied Physics Letters | en_US |
dc.subject | Internal Quantum Efficiency | en_US |
dc.subject | Current-spreading Layer | en_US |
dc.subject | Injection Efficiency | en_US |
dc.subject | Contact Junctions | en_US |
dc.subject | Lasers | en_US |
dc.subject | Algan | en_US |
dc.subject | Wells | en_US |
dc.subject | Power | en_US |
dc.title | InGaN/GaN light-emitting diode with a polarization tunnel junction | en_US |
dc.type | Article | en_US |
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