Atomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials

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buir.contributor.authorOkyay, Ali Kemal
dc.citation.epage031510-5en_US
dc.citation.issueNumber3en_US
dc.citation.spage031510-1en_US
dc.citation.volumeNumber34en_US
dc.contributor.authorTanrikulu, M. Y.en_US
dc.contributor.authorRasouli, H. R.en_US
dc.contributor.authorGhaffari, M.en_US
dc.contributor.authorTopalli K.en_US
dc.contributor.authorOkyay, Ali Kemalen_US
dc.date.accessioned2018-04-12T11:09:59Z
dc.date.available2018-04-12T11:09:59Z
dc.date.issued2016en_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentNanotechnology Research Center (NANOTAM)en_US
dc.description.abstractThis paper demonstrates the possible usage of TiOx thin films synthesized by atomic layer deposition as a microbolometer active material. Thin film electrical resistance is investigated as a function of thermal annealing. It is found that the temperature coefficient of resistance values can be controlled by coating/annealing processes, and the value as high as -9%/K near room temperature is obtained. The noise properties of TiOx films are characterized. It is shown that TiOx films grown by atomic layer deposition technique could have a significant potential to be used as a new active material for microbolometer-based applications. © 2016 American Vacuum Society.en_US
dc.description.provenanceMade available in DSpace on 2018-04-12T11:09:59Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 179475 bytes, checksum: ea0bedeb05ac9ccfb983c327e155f0c2 (MD5) Previous issue date: 2016en
dc.identifier.doi10.1116/1.4947120en_US
dc.identifier.issn0734-2101
dc.identifier.urihttp://hdl.handle.net/11693/37319
dc.language.isoEnglishen_US
dc.publisherAVS Science and Technology Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.4947120en_US
dc.source.titleJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Filmsen_US
dc.titleAtomic layer deposition synthesized TiOx thin films and their application as microbolometer active materialsen_US
dc.typeArticleen_US

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