Atomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials
Date
2016
Editor(s)
Advisor
Supervisor
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Co-Supervisor
Instructor
Source Title
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Print ISSN
0734-2101
Electronic ISSN
Publisher
AVS Science and Technology Society
Volume
34
Issue
3
Pages
031510-1 - 031510-5
Language
English
Type
Journal Title
Journal ISSN
Volume Title
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Abstract
This paper demonstrates the possible usage of TiOx thin films synthesized by atomic layer deposition as a microbolometer active material. Thin film electrical resistance is investigated as a function of thermal annealing. It is found that the temperature coefficient of resistance values can be controlled by coating/annealing processes, and the value as high as -9%/K near room temperature is obtained. The noise properties of TiOx films are characterized. It is shown that TiOx films grown by atomic layer deposition technique could have a significant potential to be used as a new active material for microbolometer-based applications. © 2016 American Vacuum Society.