Physical model for subsurface silicon writing

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dc.contributor.authorTokel, Onuren_US
dc.contributor.authorTurnalı, Ahmeten_US
dc.contributor.authorPavlov, Ihoren_US
dc.contributor.authorİlday, Fatih Ömeren_US
dc.coverage.spatialBusan, South Koreaen_US
dc.date.accessioned2018-04-12T11:50:18Z
dc.date.available2018-04-12T11:50:18Z
dc.date.issued2016en_US
dc.departmentDepartment of Physicsen_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.descriptionDate of Conference: 24-28 August 2015en_US
dc.descriptionConference Name: 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015en_US
dc.description.abstractWe have recently reported a direct laser writing method enabling buried structures deep inside silicon. Here we study the formation of these subsurface structures. We take advantage of Nonlinearity Engineering to understand this new phenomenon.en_US
dc.identifier.doi10.1109/CLEOPR.2015.7375985en_US
dc.identifier.urihttp://hdl.handle.net/11693/37758
dc.language.isoEnglishen_US
dc.publisherIEEEen_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/CLEOPR.2015.7375985en_US
dc.source.titleProceedings of the 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015en_US
dc.subjectBuried structureen_US
dc.subjectDirect laser writingen_US
dc.subjectPhysical modelen_US
dc.subjectSubsurface structuresen_US
dc.titlePhysical model for subsurface silicon writingen_US
dc.typeConference Paperen_US

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