Response of polyelectrolyte layers to the SiO2 substrate charging as probed by XPS

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buir.contributor.authorSüzer, Şefik
dc.citation.epage1760en_US
dc.citation.issueNumber3en_US
dc.citation.spage1757en_US
dc.citation.volumeNumber25en_US
dc.contributor.authorConger, C. P.en_US
dc.contributor.authorSüzer, Şefiken_US
dc.date.accessioned2016-02-08T10:05:21Z
dc.date.available2016-02-08T10:05:21Z
dc.date.issued2009en_US
dc.departmentDepartment of Chemistryen_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractA single layer of the Cationic polyelectrolyte poly(allyamine) hydrochloride (PAH) deposited, using the layer-by-layer technique, on a silicon substrate containing 5 nm oxide layer is investigated by XPS while applying an external potential bias to the sample to control and manipulate the charge built-up on the oxide layer. Under application of a -10 V bias, the oxide layer is positively charged due to Photoemission process, evidenced by the measured Si2p binding energy of 104.4 eV. Application of a +10 V bias attracts the low energy neutralizing electrons, stemming from a hot filament, and leads to a negatively charged oxide layer, also evidenced by the measured Si2p binding energy of 102.9 eV. The single polyelectrolyte overlayer also responds to this polarity change of the oxide layer underneath by displaying a somewhat larger shifts both in the C1s and Nls peaks. In addition to the shifts in the positions, the N1s peaks undergo a significant intensity depletion, mostly on the positively charged -N+ component. We interpret this intensity depletion to be the result of reorientation of some of the dangling positively charged groups by moving toward the negatively charged oxide underlayer. To our knowledge this is the first time that a chemically specific response to an electrical stimuli is reported using XPS. A bilayer LbL film consisting of PAH and PSS, exhibits even a larger charging shift, but this time no intensity alteration is observed, most probably due to locking of the -N+ groups by the -SO3 + counterions of the second layer. © 2009 American Chemical Society.en_US
dc.identifier.doi10.1021/la803305wen_US
dc.identifier.issn0743-7463
dc.identifier.urihttp://hdl.handle.net/11693/22834
dc.language.isoEnglishen_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/la803305wen_US
dc.source.titleLangmuiren_US
dc.subjectAtomsen_US
dc.subjectBinding sitesen_US
dc.subjectHot electronsen_US
dc.subjectNuclear energyen_US
dc.subjectPolyelectrolytesen_US
dc.subjectPolymersen_US
dc.subjectPotential energyen_US
dc.subjectSemiconducting silicon compoundsen_US
dc.subjectSilicon compoundsen_US
dc.subjectSubstratesen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectBi layersen_US
dc.subjectCationic polyelectrolytesen_US
dc.subjectCounter-ionsen_US
dc.subjectElectrical stimulusen_US
dc.subjectExternal potentialsen_US
dc.subjectHot filamentsen_US
dc.subjectIntensity alterationsen_US
dc.subjectLayer-by-layer techniquesen_US
dc.subjectLow energiesen_US
dc.subjectOxide layersen_US
dc.subjectPhotoemission processen_US
dc.subjectPolarity changesen_US
dc.subjectPolyelectrolyte layersen_US
dc.subjectPositively chargeden_US
dc.subjectSecond layersen_US
dc.subjectSilicon substratesen_US
dc.subjectSingle layersen_US
dc.subjectSubstrate chargingen_US
dc.subjectUnderlayeren_US
dc.subjectXpsen_US
dc.subjectBinding energyen_US
dc.subjectChemistryen_US
dc.subjectSpectroscopyen_US
dc.subjectElectrolytesen_US
dc.subjectMolecular probesen_US
dc.subjectSilicon dioxideen_US
dc.subjectSpectrum analysisen_US
dc.titleResponse of polyelectrolyte layers to the SiO2 substrate charging as probed by XPSen_US
dc.typeArticleen_US

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Department of Chemistry
Institute of Materials Science and Nanotechnology (UNAM)