Soft x-ray photoemission studies of Hf oxidation

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Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

Source Title

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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A I P Publishing LLC

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Published Version (Please cite this version)

Language

English