Soft x-ray photoemission studies of Hf oxidation

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Soft x-ray photoemission studies of Hf oxidation.pdf (285.51 KB)

Date

2003

Authors

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Source Title

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Print ISSN

0734-2101

Electronic ISSN

Publisher

A I P Publishing LLC

Volume

21

Issue

1

Pages

106 - 109

Language

English

Type

Article

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Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

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Keywords

Binding energy , Fermi level , Oxidation , Photoemission , Polycrystalline materials , Spectroscopy , Hafnium dioxide , Polycrystalline hafnium foil , Soft x ray photoemission spectroscopy , Valence band offset , Hafnium compounds

Citation

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http://hdl.handle.net/11693/24554

item.page.isversionof

http://dx.doi.org/10.1116/1.1525816

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Department of Chemistry