Soft x-ray photoemission studies of Hf oxidation

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Soft x-ray photoemission studies of Hf oxidation.pdf (285.51 KB)

Date

2003

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Source Title

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Print ISSN

0734-2101

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Publisher

A I P Publishing LLC

Volume

21

Issue

1

Pages

106 - 109

Language

English

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Article

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Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

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Keywords

Binding energy, Fermi level, Oxidation, Photoemission, Polycrystalline materials, Spectroscopy, Hafnium dioxide, Polycrystalline hafnium foil, Soft x ray photoemission spectroscopy, Valence band offset, Hafnium compounds

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http://hdl.handle.net/11693/24554

Published Version (Please cite this version)

http://dx.doi.org/10.1116/1.1525816

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Scholarly Publications - Chemistry