Dependence of Josephson junction critical current on the deposition rate of YBa2Cu3O7-δ thin films

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dc.citation.spage762
dc.citation.volumeNumber899
dc.contributor.authorAlgül, B. P.
dc.contributor.authorAvcı, İ.
dc.contributor.authorAkram, R.
dc.contributor.authorBozbey, Ali
dc.contributor.authorTepe, M.
dc.contributor.authorAbukay, D.
dc.coverage.spatialİstanbul, Turkey
dc.date.accessioned2016-02-08T11:44:15Z
dc.date.available2016-02-08T11:44:15Z
dc.date.issued2007
dc.departmentDepartment of Electrical and Electronics Engineering
dc.description.abstractWe have reported the effect of YBa2Cu3O 7-δ (YBCO) thin film deposition rate on the 24 and 30 degree STO bicrystal Josephson junctions critical currents by fabricating series of junctions with different deposition rates. Dependence of YBCO thin film structures on the deposition rate was investigated. We have observed that the critical currents of junctions are strongly affected by the thin film deposition rate.
dc.identifier.doi10.1063/1.2733503
dc.identifier.issn0094-243X
dc.identifier.urihttp://hdl.handle.net/11693/27099
dc.language.isoEnglish
dc.publisherAmerican Institute of Physics
dc.relation.isversionofhttps://doi.org/10.1063/1.2733503
dc.source.titleAIP Conference Proceedings
dc.subjectDeposition rate
dc.subjectJosephson junctions
dc.titleDependence of Josephson junction critical current on the deposition rate of YBa2Cu3O7-δ thin films
dc.typeConference Paper

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