Visible light nearly perfect absorber: an optimum unit cell arrangement for near absolute polarization insensitivity
buir.contributor.orcid | Özbay, Ekmel|0000-0003-2953-1828 | |
dc.citation.epage | 27634 | en_US |
dc.citation.issueNumber | 22 | en_US |
dc.citation.spage | 27624 | en_US |
dc.citation.volumeNumber | 25 | en_US |
dc.contributor.author | Ghobadi, Amir | en_US |
dc.contributor.author | Hajian, Hodjat | en_US |
dc.contributor.author | Gökbayrak, Murat | en_US |
dc.contributor.author | Dereshgi, Sina Abedini | en_US |
dc.contributor.author | Toprak, Ahmet | en_US |
dc.contributor.author | Butun, Bayram | en_US |
dc.contributor.author | Özbay, Ekmel | en_US |
dc.date.accessioned | 2018-04-12T11:00:43Z | |
dc.date.available | 2018-04-12T11:00:43Z | |
dc.date.issued | 2017 | en_US |
dc.department | Nanotechnology Research Center (NANOTAM) | en_US |
dc.department | Department of Electrical and Electronics Engineering | en_US |
dc.department | Department of Physics | en_US |
dc.department | Institute of Materials Science and Nanotechnology (UNAM) | en_US |
dc.description.abstract | In this work, we propose an optimum unit cell arrangement to obtain near absolute polarization insensitivity in a metal-insulator-metal (MIM) based ultra-broadband perfect absorber. Our findings prove that upon utilizing this optimum arrangement, the response of the absorber is retained and unchanged over all arbitrary incidence light polarizations, regardless of the shape of the top metal patch. First, the impact of the geometry of the top nanopatch resonators on the absorption bandwidth of the overall structure is explored. Then, the response of the MIM design for different incidence polarizations and angles is scrutinized. Finally, the proposed design is fabricated and characterized. © 2017 Optical Society of America. | en_US |
dc.description.provenance | Made available in DSpace on 2018-04-12T11:00:43Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 179475 bytes, checksum: ea0bedeb05ac9ccfb983c327e155f0c2 (MD5) Previous issue date: 2017 | en |
dc.identifier.doi | 10.1364/OE.25.027624 | en_US |
dc.identifier.issn | 10944087 | |
dc.identifier.uri | http://hdl.handle.net/11693/37029 | |
dc.language.iso | English | en_US |
dc.publisher | OSA - The Optical Society | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1364/OE.25.027624 | en_US |
dc.source.title | Optics Express | en_US |
dc.subject | Light | en_US |
dc.subject | Metal insulator boundaries | en_US |
dc.subject | Polarization | en_US |
dc.subject | Metal insulator metals | en_US |
dc.subject | Metal patch | en_US |
dc.subject | Perfect absorber | en_US |
dc.subject | Polarization insensitivity | en_US |
dc.subject | Ultra-broadband | en_US |
dc.subject | Unit cells | en_US |
dc.subject | Visible light | en_US |
dc.subject | MIM devices | en_US |
dc.title | Visible light nearly perfect absorber: an optimum unit cell arrangement for near absolute polarization insensitivity | en_US |
dc.type | Article | en_US |
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