Enhanced photoresponse of conformal TiO2/Ag nanorod array-based Schottky photodiodes fabricated via successive glancing angle and atomic layer deposition

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buir.contributor.authorBıyıklı, Necmi
buir.contributor.authorOkyay, Ali Kemal
dc.citation.issueNumber1en_US
dc.citation.volumeNumber33en_US
dc.contributor.authorHaider A.en_US
dc.contributor.authorCansizoglu, H.en_US
dc.contributor.authorCansizoglu, M. F.en_US
dc.contributor.authorKarabacak, T.en_US
dc.contributor.authorOkyay, Ali Kemalen_US
dc.contributor.authorBıyıklı, Necmien_US
dc.date.accessioned2016-02-08T10:23:59Z
dc.date.available2016-02-08T10:23:59Z
dc.date.issued2015en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentNanotechnology Research Center (NANOTAM)en_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractIn this study, the authors demonstrate a proof of concept nanostructured photodiode fabrication method via successive glancing angle deposition (GLAD) and atomic layer deposition (ALD). The fabricated metal-semiconductor nanorod (NR) arrays offer enhanced photoresponse compared to conventional planar thin-film counterparts. Silver (Ag) metallic NR arrays were deposited on Ag-film/Si templates by utilizing GLAD. Subsequently, titanium dioxide (TiO2) was deposited conformally on Ag NRs via ALD. Scanning electron microscopy studies confirmed the successful formation of vertically aligned Ag NRs deposited via GLAD and conformal deposition of TiO2 on Ag NRs via ALD. Following the growth of TiO2 on Ag NRs, aluminum metallic top contacts were formed to complete the fabrication of NR-based Schottky photodiodes. Nanostructured devices exhibited a photo response enhancement factor of 1.49 × 102 under a reverse bias of 3 V. © 2014 American Vacuum Society.en_US
dc.description.provenanceMade available in DSpace on 2016-02-08T10:23:59Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 70227 bytes, checksum: 26e812c6f5156f83f0e77b261a471b5a (MD5) Previous issue date: 2015en
dc.identifier.doi10.1116/1.4898203en_US
dc.identifier.issn0734-2101
dc.identifier.urihttp://hdl.handle.net/11693/24092
dc.language.isoEnglishen_US
dc.publisherAVS Science and Technology Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.4898203en_US
dc.source.titleJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Filmsen_US
dc.subjectDepositionen_US
dc.subjectFabricationen_US
dc.subjectNanorodsen_US
dc.subjectPhotodiodesen_US
dc.subjectScanning electron microscopyen_US
dc.subjectSilveren_US
dc.subjectTitanium dioxideen_US
dc.subjectConformal depositionen_US
dc.subjectEnhancement factoren_US
dc.subjectFabrication methoden_US
dc.subjectGlancing Angle Depositionen_US
dc.subjectMetal semiconductorsen_US
dc.subjectProof of concepten_US
dc.subjectSchottky photodiodesen_US
dc.subjectVertically aligneden_US
dc.subjectAtomic layer depositionen_US
dc.titleEnhanced photoresponse of conformal TiO2/Ag nanorod array-based Schottky photodiodes fabricated via successive glancing angle and atomic layer depositionen_US
dc.typeArticleen_US

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