Crystallization of Ge in SiO2 matrix by femtosecond laser processing

buir.contributor.authorAydınlı, Atilla
dc.citation.epage011807-5en_US
dc.citation.issueNumber1en_US
dc.citation.spage11807-1en_US
dc.citation.volumeNumber30en_US
dc.contributor.authorSalihoglu, O.en_US
dc.contributor.authorKürüm, U.en_US
dc.contributor.authorYaglioglu, H. G.en_US
dc.contributor.authorElmali, A.en_US
dc.contributor.authorAydınlı, Atillaen_US
dc.date.accessioned2015-07-28T12:05:00Z
dc.date.available2015-07-28T12:05:00Z
dc.date.issued2012-01-19en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractGermanium nanocrystals embedded in a siliconoxide matrix has been fabricated by single femtosecond laser pulse irradiation of germanium doped SiO2 thin films deposited with plasma enhanced chemical vapor deposition. SEM and AFM are used to analyze surface modification induced by laser irradiation. Crystallization of Ge in the oxide matrix is monitored with the optic phonon at 300 cm(-1) as a function of laser fluence. Both the position the linewidth of the phonon provides clear signature for crystallization of Ge. In PL experiments, strong luminescence around 600 nm has been observed.en_US
dc.description.provenanceMade available in DSpace on 2015-07-28T12:05:00Z (GMT). No. of bitstreams: 1 10.1116-1.3677829.pdf: 1027037 bytes, checksum: 36deb151dac7f2986ccb0ed56c7947c9 (MD5)en
dc.identifier.doi10.1116/1.3677829en_US
dc.identifier.issn1071-1023
dc.identifier.urihttp://hdl.handle.net/11693/13185
dc.language.isoEnglishen_US
dc.publisherAmerican Vacuum Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.3677829en_US
dc.source.titleJournal of Vacuum Science and Technology Ben_US
dc.subjectSilicon Oxide-filmsen_US
dc.subjectGermanium nanocrystalsen_US
dc.subjectAmorphous-siliconen_US
dc.subjectVisible photoluminescenceen_US
dc.subjectLight-emissionen_US
dc.subjectThin-filmsen_US
dc.subjectLuminescenceen_US
dc.subjectDefectsen_US
dc.subjectPulsesen_US
dc.subjectChargeen_US
dc.titleCrystallization of Ge in SiO2 matrix by femtosecond laser processingen_US
dc.typeArticleen_US

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