Double subband occupation of the two-dimensional electron gas in InxAl1-XN/AlN/GaN/AlN heterostructures with a low indium content (0.064 ≤ x ≤ 0.140) barrier
buir.contributor.author | Özbay, Ekmel | |
buir.contributor.orcid | Özbay, Ekmel|0000-0003-2953-1828 | |
dc.citation.epage | 5575 | en_US |
dc.citation.issueNumber | 19 | en_US |
dc.citation.spage | 5572 | en_US |
dc.citation.volumeNumber | 518 | en_US |
dc.contributor.author | Lisesivdin, S. B. | en_US |
dc.contributor.author | Tasli, P. | en_US |
dc.contributor.author | Kasap, M. | en_US |
dc.contributor.author | Ozturk, M. | en_US |
dc.contributor.author | Arslan, E. | en_US |
dc.contributor.author | Ozcelik, S. | en_US |
dc.contributor.author | Özbay, Ekmel | en_US |
dc.date.accessioned | 2016-02-08T09:57:45Z | |
dc.date.available | 2016-02-08T09:57:45Z | |
dc.date.issued | 2010-05-08 | en_US |
dc.department | Nanotechnology Research Center (NANOTAM) | en_US |
dc.department | Department of Electrical and Electronics Engineering | en_US |
dc.department | Department of Physics | en_US |
dc.description.abstract | We present a carrier transport study on low indium content (0.064 ≤ x ≤ 0.140) InxAl1 - xN/AlN/GaN/AlN heterostructures. Experimental Hall data were carried out as a function of temperature (33-300 K) and a magnetic field (0-1.4 T). A two-dimensional electron gas (2DEG) with single or double subbands and a two-dimensional hole gas were extracted after implementing quantitative mobility spectrum analysis on the magnetic field dependent Hall data. The mobility of the lowest subband of 2DEG was found to be lower than the mobility of the second subband. This behavior is explained by way of interface related scattering mechanisms, and the results are supported with a one-dimensional self-consistent solution of non-linear Schrödinger- Poisson equations. | en_US |
dc.description.provenance | Made available in DSpace on 2016-02-08T09:57:45Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 70227 bytes, checksum: 26e812c6f5156f83f0e77b261a471b5a (MD5) Previous issue date: 2010 | en |
dc.identifier.doi | 10.1016/j.tsf.2010.04.120 | en_US |
dc.identifier.issn | 0040-6090 | |
dc.identifier.uri | http://hdl.handle.net/11693/22265 | |
dc.language.iso | English | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1016/j.tsf.2010.04.120 | en_US |
dc.source.title | Thin Solid Films | en_US |
dc.subject | Hall effect | en_US |
dc.subject | Indium aluminum nitride | en_US |
dc.subject | Metal organic chemical vapor deposition | en_US |
dc.subject | Two dimensional electron gas | en_US |
dc.subject | Metallorganic chemical vapor deposition | en_US |
dc.title | Double subband occupation of the two-dimensional electron gas in InxAl1-XN/AlN/GaN/AlN heterostructures with a low indium content (0.064 ≤ x ≤ 0.140) barrier | en_US |
dc.type | Article | en_US |
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