High efficiency 1.9 Kw single diode laser bar epitaxially stacked with a tunnel junction

buir.contributor.authorDemir, Abdullah
buir.contributor.orcidDemir, Abdullah|0000-0003-4678-0084
dc.citation.epage1500708 / 9en_US
dc.citation.issueNumber3en_US
dc.citation.spage1500708 / 1en_US
dc.citation.volumeNumber13en_US
dc.contributor.authorZhao, Y.
dc.contributor.authorWang, Z.
dc.contributor.authorDemir, Abdullah
dc.contributor.authorYang, G.
dc.contributor.authorMa, S.
dc.contributor.authorXu, B.
dc.contributor.authorSun, C.
dc.contributor.authorLi, B.
dc.contributor.authorQiu, B.
dc.date.accessioned2022-01-26T06:29:30Z
dc.date.available2022-01-26T06:29:30Z
dc.date.issued2021-04-21
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractWe report on the development of a 940-nm diode laser bar based on epitaxially stacked active regions by employing a tunnel junction structure. The tunnel junction and the device parameters were systematically optimized to achieve high output and power conversion efficiency. A record quasi-continuous wave (QCW) peak power of 1.91 kW at 25 °C was demonstrated from a 1-cm wide bar with a 2-mm cavity length at 1 kA drive current (200 μs pulse width and 10 Hz repetition rate). Below the onset of the thermal rollover, the slope efficiency was as high as 2.23 W/A. The maximum power conversion efficiency of 61.1% at 25 °C was measured at 300 A. Reducing the heatsink temperature to 15 °C led to a marginal increase in the peak power to 1.95 kW.en_US
dc.identifier.doi10.1109/JPHOT.2021.3073732en_US
dc.identifier.eissn1943-0655
dc.identifier.urihttp://hdl.handle.net/11693/76782
dc.language.isoEnglishen_US
dc.publisherIEEEen_US
dc.relation.isversionofhttps://doi.org/10.1109/JPHOT.2021.3073732en_US
dc.source.titleIEEE Photonics Journalen_US
dc.subjectSemiconductor laseren_US
dc.subjectDiode laser baren_US
dc.subjectHigh poweren_US
dc.subjectPower conversion efficiencyen_US
dc.subjectTunnel junctionen_US
dc.titleHigh efficiency 1.9 Kw single diode laser bar epitaxially stacked with a tunnel junctionen_US
dc.typeArticleen_US

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