All-aluminum hierarchical plasmonic surfaces in the infrared

dc.citation.epage830en_US
dc.citation.issueNumber3en_US
dc.citation.spage823en_US
dc.citation.volumeNumber6en_US
dc.contributor.authorAyas S.en_US
dc.contributor.authorBakan, G.en_US
dc.contributor.authorDana, A.en_US
dc.date.accessioned2018-04-12T10:54:35Z
dc.date.available2018-04-12T10:54:35Z
dc.date.issued2016en_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractAll-Aluminum metal-insulator-metal resonator structures withmultiple metal-insulator stacks showing resonances in the mid-infrared(MIR) are fabricated. Ultrathin native Al2O3 is used as the insulator layersenabling simple fabrication of the resonator structures. The structures withtwo oxide layers exhibit two distinct resonances in the MIR. Simulation ofthese structures shows confinement of magnetic field to the thicker bottomoxide at the shorter wavelength resonance and to the thinner top oxide at theother resonance. Simulations of higher order hierarchical structures with 3 and 4 oxide layers show multispectral response with precise control of theoxide thicknesses. The studied structures show great potential for IRapplications that require durability and multispectral characteristics.en_US
dc.identifier.doi10.1364/OME.6.000823en_US
dc.identifier.issn2159-3930
dc.identifier.urihttp://hdl.handle.net/11693/36820
dc.language.isoEnglishen_US
dc.publisherThe Optical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OME.6.000823en_US
dc.source.titleOptical Materials Expressen_US
dc.subjectAluminumen_US
dc.subjectResonanceen_US
dc.subjectResonatorsen_US
dc.subjectAluminum metalen_US
dc.subjectHierarchical structuresen_US
dc.subjectHigher-orderen_US
dc.subjectMetal insulatorsen_US
dc.subjectMulti-spectralen_US
dc.subjectPrecise controlen_US
dc.subjectResonator structuresen_US
dc.subjectShorter wavelengthen_US
dc.subjectMetal insulator boundariesen_US
dc.titleAll-aluminum hierarchical plasmonic surfaces in the infrareden_US
dc.typeArticleen_US

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