A theoretical model for the epitaxial growth of Si(100) surface

buir.advisorÇıracı, Salim
dc.contributor.authorDağ, Sefa
dc.date.accessioned2016-01-08T20:17:41Z
dc.date.available2016-01-08T20:17:41Z
dc.date.issued2000
dc.departmentDepartment of Physicsen_US
dc.descriptionAnkara : Department of Physics and the Institute of Engineering and Science of Bilkent Univ., 2000.en_US
dc.descriptionThesis (Master's) -- Bilkent University, 2000.en_US
dc.descriptionIncludes bibliographical references leaves 62.en_US
dc.description.abstractIn this thesis, we investigated atomic scale mechanisms of growth on the Si(lOO) surface. First principles quantum molecular dynamics calculations are performed, where self-consistent field electronic structure calculations within the density functional theory, and ionic relaxations carried out concomitantly. By using this method, we first determined the binding energy and binding sites of adatoms and ad-dimers. In the second stage, we simulated different configuration of dimer construction. In the third stage, we analyzed temperature dependent behaviour of dimers and we investigated translational and rotational motion of dimers. Finally, we presented a new theoretical model for ID epitaxial growth.en_US
dc.description.degreeM.S.en_US
dc.description.statementofresponsibilityDağ, Sefaen_US
dc.format.extent[ix], 64 leavesen_US
dc.identifier.itemidBILKUTUPB051125
dc.identifier.urihttp://hdl.handle.net/11693/18253
dc.language.isoEnglishen_US
dc.publisherBilkent Universityen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectSiliconen_US
dc.subjectDimer bondsen_US
dc.subjectTemperatureen_US
dc.subjectEpitaxial growthen_US
dc.subjectAB-initio electronic structureen_US
dc.subject.lccQC611.8.S5 D34 2000en_US
dc.subject.lcshSemiconductors--Surfaces.en_US
dc.subject.lcshSilicon.en_US
dc.titleA theoretical model for the epitaxial growth of Si(100) surfaceen_US
dc.typeThesisen_US

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