Browsing by Subject "Soft x - ray photoelectron spectroscopy"
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Item Open Access Soft x-ray photoemission studies of the HfO2/SiO2/Si system(American Institute of Physics, 2002) Sayan, S.; Garfunkel, E.; Süzer, ŞefikSoft x-ray photoelectron spectroscopy with synchrotron radiation was employed to study the valence-band offsets for the HfO2/SiO 2/Si and HfO2/SiOxNy/Si systems. We obtained a valence-band offset difference of -1.05±0.1eV between HfO 2 (in HfO2/15ÅSiO2/Si) and SiO 2 (in 15 Å SiO2/Si). There is no measurable difference between the HfO2 valence-band maximum positions of the HfO2/10ÅSiOxNy/Si and HfO 2/15ÅSiO2/Si systems. © 2002 American Institute of Physics.