Browsing by Subject "Silicon oxynitride film"
Now showing 1 - 2 of 2
Results Per Page
Sort Options
Item Open Access An elastomeric grating coupler(IOP Institute of Physics, 2006) Kocabas, A.; Ay, F.; Dâna, A.; Aydınlı, AtillaWe report on a novel nondestructive and reversible method for coupling free space light to planar optical waveguides. In this method, an elastomeric grating is used to produce an effective refractive index modulation on the surface of the optical waveguide. The external elastomeric grating binds to the surface of the waveguide with van der Waals forces and makes conformal contact without any applied pressure. As a demonstration of the feasibility of the approach, we use it to measure the refractive index of a silicon oxynitride film. This technique is nondestructive, reversible, low cost and can easily be applied to the characterization of optical materials for integrated optics. © 2006 IOP Publishing Ltd.Item Open Access Structural and loss characterization of SiON layers for optical waveguide applications(IEEE, 2000) Ay, Feridun; Aydınlı, Atilla; Roeloffzen, C.; Driessen, A.Silicon oxynitride films for optical waveguide applications were grown at 350°C in a PECVD reactor. ATR-FTIR spectroscopy was used to identify the bond structure and absorption characteristics in the mid-infrared region. Annealing of the films was performed together with close monitoring of the N-H bond at 3400 cm-1 and correlated with optical loss measurements. The possibility of a new method for the reduction of the N-H bonds without annealing is discussed.