Browsing by Subject "Hafnium oxides"

Now showing 1 - 4 of 4

Open Access
Area-selective atomic layer deposition using an inductively coupled plasma polymerized fluorocarbon layer: A case study for metal oxides
(American Chemical Society, 2016) Haider, A.; Deminskyi, P.; Khan, T. M.; Eren, H.; Bıyıklı, Necmi
Area-selective atomic layer deposition (AS-ALD) has attracted immense attention in recent years for self-aligned accurate pattern placement with subnanometer thickness control. Here, we demonstrate a methodology to achieve AS-ALD by using inductively couple plasma (ICP) grown fluorocarbon polymer film as hydrophobic blocking layer for selective deposition. Our approach has been tested for metal-oxide materials including ZnO, Al2O3, and HfO2. Contact angle, X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometer, and scanning electron microscopy (SEM) measurements were performed to investigate the blocking ability of plasma polymerized fluorocarbon layers against ALD-grown metal-oxide films. A considerable growth inhibition for ZnO has been observed on fluorocarbon coated Si(100) surfaces, while the same polymerized surface caused a relatively slow nucleation for HfO2 films. No growth selectivity was obtained for Al2O3 films, displaying almost the same nucleation behavior on Si and fluorocarbon surfaces. Thin film patterning has been demonstrated using this strategy by growing ZnO on lithographically patterned fluorocarbon/Si samples. High resolution SEM images and XPS line scan confirmed the successful patterning of ZnO up to a film thickness of ∼15 nm. © 2016 American Chemical Society.
Open Access
MIMIM photodetectors using plasmonically enhanced MIM absorbers
(SPIE, 2017) Dereshgi, S. Abedini; Okyay, Ali Kemal
We demonstrate super absorbing metal-insulator-metal (MIM) stacks and MIMIM photosensitive devices operating at visible and near-infrared (VIS-NIR) spectrum, where absorbing (top) MIM and photocollecting (bottom) MIM can be optimized separately. We investigate different bottom metals in absorbing MIM with nanoparticles realized by dewetting of silver thin film on top. While gold and silver have conventionally been considered the most appropriate plasmonic absorbers, we demonstrate different absorbing metals like aluminum and specifically chromium, with its plasma frequency happening at 850 nm, as more efficient layers for absorption. Absorption in chromium hits 82 percent around 1000 nm. We provide convincing evidences by doing reflection experiment and computational simulations for absorbing MIM part. We also suggest for the first time investigating electric loss tangent of metal or coherently, surface plasmon quality factor of absorbing metals which are reliable tools for engineering different metal layers. They reveal that despite the fact that gold and silver are good plasmonic scatterers in VIS-NIR and reliable absorbers in VIS region, they are not proper choices as absorbers for NIR applications. Once the most optimum absorbing design is pointed out, we integrate it on top of another metal-insulator to form an MIMIM photodetector with tunneling photocurrent path. The final optimized sample consisting of silver - hafnium oxide - chromium - aluminum oxide - silver nanoparticles (from bottom to top) has a dark current of 7nA and a photoresponsivity peak of 0.962 mA/W at 1000 nm and a full width at half maximum of 300 nm, while applied bias is 50 mV and device areas are 300 μm x 600 μm. This photoresponse shows 70 times enhancement compared to former reported spin coated rare nanoparticle MIMIMs.
Open Access
Performance enhancement of GaN metal-semiconductor-metal ultraviolet photodetectors by insertion of ultrathin interfacial HfO2 layer
(AVS Science and Technology Society, 2015) Kumar, M.; Tekcan, B.; Okyay, Ali Kemal
The authors demonstrate improved device performance of GaN metal-semiconductor-metal ultraviolet (UV) photodetectors (PDs) by ultrathin HfO2 (UT-HfO2) layer on GaN. The UT-HfO2 interfacial layer is grown by atomic layer deposition. The dark current of the PDs with UT-HfO2 is significantly reduced by more than two orders of magnitude compared to those without HfO2 insertion. The photoresponsivity at 360 nm is as high as 1.42 A/W biased at 5 V. An excellent improvement in the performance of the devices is ascribed to allowed electron injection through UT-HfO2 on GaN interface under UV illumination, resulting in the photocurrent gain with fast response time. © 2015 American Vacuum Society.
Open Access
Soft x-ray photoemission studies of the HfO2/SiO2/Si system
(American Institute of Physics, 2002) Sayan, S.; Garfunkel, E.; Süzer, Şefik
Soft x-ray photoelectron spectroscopy with synchrotron radiation was employed to study the valence-band offsets for the HfO2/SiO 2/Si and HfO2/SiOxNy/Si systems. We obtained a valence-band offset difference of -1.05±0.1eV between HfO 2 (in HfO2/15ÅSiO2/Si) and SiO 2 (in 15 Å SiO2/Si). There is no measurable difference between the HfO2 valence-band maximum positions of the HfO2/10ÅSiOxNy/Si and HfO 2/15ÅSiO2/Si systems. © 2002 American Institute of Physics.