Browsing by Subject "Film growth"

Now showing 1 - 8 of 8

Open Access
Dependence of the substrate structure and the film growth at the junction of YBCO SEJ rf-SQUIDs on the IBE process and effects on the SQUID's characteristics
(Elsevier, 2002) Fardmanesh, Mehdi; Schubert, J.; Akram, Rizwan; Banzet, M.; Zander, W.; Zhang, Y.; Schilling, M.; Krause, H-J.
Step edge junction (SEJ) rf-SQUIDs were made of 200 nm thick YBCO films on LaAlO3(100) substrates using pulsed laser deposition technique. The steps on the substrates were developed using a combination of stationary and rotating angled argon ion beams with different beam energies and intensities. While sharp clean steps with heights up to 300 nm were obtained on the substrates using the combinatorial ion beam etching (IBE) process, very shallow ramp-type surfaces were found developing on the bottom of the trench, close to the steps. The ramp-type surfaces were found to be a source of hole-type defects in the films grown at the step edges. High quality films could be obtained on the flat regions away from the steps. Higher defect densities in the films close to the SEJs resulted in devices with higher 1/f noise and wider spread of the junction parameters. The 1/f noise of such devices increased with decreasing temperature. High quality films on sharp clean steps with flat substrate surfaces, developed using optimized combinatorial IBE process, resulted in higher yield of low 1/f noise SQUIDs. The Ic of the junctions and hence the working temperature of the SQUID could also be controlled by the junction width and the step height.
Open Access
Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
(IEEE, 2016) Haider, Ali; Kizir, Seda; Deminskyi, P.; Tsymbalenko, Oleksandr; Leghari, Shahid Ali; Bıyıklı, Necmi; Alevli, M.; Gungor, N.
GaN thin films grown by hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD) at two different substrate temperatures (250 and 450 °C) are compared. Effect of two different Ga source materials named as trimethylgallium (TMG) and triethylgallium (TEG) on GaN growth and film quality is also investigated and reviewed. Films were characterized by X-ray photoelectron spectroscopy, spectroscopic ellipsometery, and grazing incidence X-ray diffraction. GaN film deposited by TMG revealed better structural, chemical, and optical properties in comparison with GaN film grown with TEG precursor. When compared on basis of different substrate temperature, GaN films grown at higher substrate temperature revealed better structural and optical properties.
Open Access
Experimental and theoretical studies of transport through large scale, partially aligned arrays of single-walled carbon nanotubes in thin film type transistors
(2007) Kocabas, C.; Pimparkar, N.; Yesilyurt O.; Kang, S.J.; Alam, M.A.; Rogers J.A.
Gate-modulated transport through partially aligned films of single-walled carbon nanotubes (SWNTs) in thin film type transistor structures are studied experimentally and theoretically. Measurements are reported on SWNTs grown by chemical vapor deposition with systematically varying degrees of alignment and coverage in transistors with a range of channel lengths and orientations perpendicular and parallel to the direction of alignment. A first principles stick-percolation-based transport model provides a simple, yet quantitative framework to interpret the sometimes counterintuitive transport parameters measured in these devices. The results highlight, for example, the dramatic influence of small degrees of SWNT misalignment on transistor performance and imply that coverage and alignment are correlated phenomena and therefore should be simultaneously optimized. The transport characteristics reflect heterogeneity in the underlying anisotropic metal-semiconductor stick-percolating network and cannot be reproduced by classical transport models. © 2007 American Chemical Society.
Open Access
Seed layer assisted hydrothermal deposition of low-resistivity ZnO thin films
(Materials Research Society, 2017) Chubenko, E.; Bondarenko, V.; Ghobadi, Amir; Ulusoy, Gamze; Topallı, Kağan; Okyay, Ali Kemal
In this work, we describe the combination of hydrothermal and atomic layer deposition (ALD) for growing low-resistivity ZnO polycrystalline continuous films. The effect of the thickness of ALD seed layers on the morphology of the hydrothermal ZnO films was studied. It was shown that ZnO films hydrothermally deposited on very thin seed layer consist of separate nanorods but in the case of 20 nm seed layer ZnO films transform to uniform continuous layers comprising of closely packed vertically aligned crystallites. Photoluminescence spectra were shown to exhibit broad band behavior in the visible range, corresponding to radiative recombination processes via oxygen defects of ZnO crystalline lattice, and narrow band in the UV region, associated with band-to-band recombination processes. It was shown that the resistivity of the obtained ZnO films is decreased gradually with the increase of ZnO films thickness and determined by the presence of crystal lattice defects in the seed layer.
Open Access
Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
(AVS Science and Technology Society, 2016) Kizir, S.; Haider, A.; Bıyıklı, Necmi
Gallium nitride (GaN) thin films were grown on Si (100), Si (111), and c-plane sapphire substrates at 200 ï¿½C via hollow-cathode plasma-assisted atomic layer deposition (HCPA-ALD) using GaEt3 and N2/H2 plasma as group-III and V precursors, respectively. The main aim of the study was to investigate the impact of substrate on the material properties of low-temperature ALD-grown GaN layers. Structural, chemical, and optical characterizations were carried out in order to evaluate and compare film quality of GaN on different substrates. X-ray reflectivity measurements showed film density values of 5.70, 5.74, and 5.54 g/cm3 for GaN grown on Si (100), Si (111), and sapphire, respectively. Grazing incidence x-ray diffraction measurements exhibited hexagonal wurtzite structure in all HCPA-ALD grown GaN samples. However, dominant diffraction peak for GaN films grown on Si and sapphire substrates were detected differently as (002) and (103), respectively. X-ray diffraction gonio scans measured from GaN grown on c-plane sapphire primarily showed (002) orientation. All samples exhibited similar refractive index values (∼2.17 at 632 nm) with 2-3 at. % of oxygen impurity existing within the bulk of the films. The grain size was calculated as ∼9-10 nm for GaN grown on Si (100) and Si (111) samples while it was ∼5 nm for GaN/sapphire sample. Root-mean-square surface roughness values found as 0.68, 0.76, and 1.83 nm for GaN deposited on Si (100), Si (111), and sapphire, respectively. Another significant difference observed between the samples was the film growth per cycle: GaN/sapphire sample showed a considerable higher thickness value when compared with GaN/Si samples, which might be attributed to a possibly more-efficient nitridation and faster nucleation of sapphire surface.
Open Access
Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
(AIP Publishing LLC, 2016-02) Alevli, M.; Gungor, N.; Haider A.; Kizir S.; Leghari, S. A.; Bıyıklı, Necmi
Gallium nitride films were grown by hollow cathode plasma-assisted atomic layer deposition using triethylgallium and N2/H2 plasma. An optimized recipe for GaN film was developed, and the effect of substrate temperature was studied in both self-limiting growth window and thermal decomposition-limited growth region. With increased substrate temperature, film crystallinity improved, and the optical band edge decreased from 3.60 to 3.52 eV. The refractive index and reflectivity in Reststrahlen band increased with the substrate temperature. Compressive strain is observed for both samples, and the surface roughness is observed to increase with the substrate temperature. Despite these temperature dependent material properties, the chemical composition, E1(TO), phonon position, and crystalline phases present in the GaN film were relatively independent from growth temperature.
Open Access
TEM studies of Ge nanocrystal formation in PECVD grown SiO 2: Ge / SiO2 multilayers
(Institute of Physics, 2006) Aǧan, S.; Dana, A.; Aydınlı, Atilla
We investigate the effect of annealing on the Ge nanocrystal formation in multilayered germanosilicate-oxide films grown on Si substrates by plasma enhanced chemical vapour deposition (PECVD). The multilayered samples were annealed at temperatures ranging from 750 to 900 °C for 5 min under nitrogen atmosphere. The onset of formation of Ge nanocrystals, at 750 °C, can be observed via high resolution TEM micrographs. The diameters of Ge nanocrystals were observed to be between 5 and 14 nm. As the annealing temperature is raised to 850 °C, a second layer of Ge nanocrystals forms next to the original precipitation band, positioning itself closer to the substrate SiO2 interface. High resolution cross section TEM images, electron diffraction and electron energy-loss spectroscopy as well as energy-dispersive x-ray analysis (EDAX) data all indicate that Ge nanocrystals are present in each layer. © 2006 IOP Publishing Ltd.
Open Access
Thermally poled germanosilicate films with high second-order nonlinearity
(IEEE, 2005) Özcan, A.; Digonnet, M. J. F.; Kino, G. S.; Ay, Feridun; Aydınlı, Atilla
Accurate measurements of the second-order nonlinearity profile of thermally poled low-loss germanosilicate films grown on fused-silica substrates are reported, of interest as potential electro-optic devices. After optimization, we demonstrate a record high nonlinear coefficient d 33 ≈ 1.6 pm/V, a two-fold improvement over highest reported d 33 value in fused silica that we attribute to the presence of germanium.