Browsing by Subject "Admittance"

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    Determination of current transport and trap states density in AlInGaN/GaN heterostructures
    (Elsevier, 2019) Arslan, Engin; Ural, Sertaç; Altındal, Ş.; Özbay, Ekmel
    The energy distribution and the relaxation time constant of the trap states with respect to conduction bands in the (Ni/Au) Schottky contact on AlInGaN/GaN heterostructures were investigated using the admittance technique. The potential dependent capacitance/conductance measurements were done in the frequency range of 5 kHz to 5 MHz at a temperature of 300 K. We found strong frequency dispersions at the accumulation regions and at the sharp transition regions (depletion region) in the capacitance curves. High frequency dispersion at the accumulation regions in C-V characteristics indicates that there is a high-density of surface traps between the metal–AlInGaN quaternary layer interfaces. Furthermore, the frequency dispersion at the sharp transition regions behavior can be attributed to the interface traps state between the AlInGaN quaternary layer and GaN layer. A detailed analysis of the frequency-dependent capacitance and conductance data was performed, assuming the models in which traps are located between the metal–AlInGaN interface (surface traps) and between AlInGaN/GaN interfaces (interface traps). The trap states density and time constants of the traps states were calculated as a function of energy separation from the conduction-band edge. The trap states' densities change between 1.3 × 1011 eV−1 cm−2 and 6.2 × 1011 eV−1 cm−2. Also, 4.8 to 5.3 μs time interval calculated for the relaxation times.
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    ItemOpen Access
    Investigation of trap states in AlInN/AlN/GaN heterostructures by frequency-dependent admittance analysis
    (Springer US, 2010-09-17) Arslan, Engin; Bütün, Serkan; Şafak, Yasemin; Özbay, Ekmel
    We present a systematic study on the admittance characterization of surface trap states in unpassivated and SiN x -passivated Al 0.83In 0.17N/AlN/GaN heterostructures. C-V and G/ω-V measurements were carried out in the frequency range of 1 kHz to 1 MHz, and an equivalent circuit model was used to analyze the experimental data. A detailed analysis of the frequency-dependent capacitance and conductance data was performed, assuming models in which traps are located at the metal-AlInN surface. The density (D t) and time constant (τ t) of the surface trap states have been determined as a function of energy separation from the conduction-band edge (E c - E t). The D st and τ st values of the surface trap states for the unpassivated samples were found to be D st≅ (4 - 13)× 10 12 eV - 1 cm - 2 and τ st ≈ 3 μs to 7 μs, respectively. For the passivated sample, D st decreased to 1.5× 10 12eV - 1cm - 2 and τ st to 1.8 μs to 2 μs. The density of surface trap states in Al 0.83In 0.17N/AlN/GaN heterostructures decreased by approximately one order of magnitude with SiN x passivation, indicating that the SiN x insulator layer between the metal contact and the surface of the Al 0.83In 0.17N layer can passivate surface states.