Browsing by Author "Wojcik, M."

Filter results by typing the first few letters
Now showing 1 - 2 of 2
  • Thumbnail Image
    ItemOpen Access
    Effect of growth pressure on coalescence thickness and crystal quality of GaN deposited on 4H-SiC
    (Elsevier, 2010-09-25) Caban, P.; Strupinski, W.; Szmidt, J.; Wojcik, M.; Gaca, J.; Kelekci, O.; Caliskan, D.; Özbay, Ekmel
    The influence of growth pressure on the coalescence thickness and the crystal quality of GaN deposited on 4HSiC by low pressure metalorganic vapor phase epitaxy was studied. It was shown that growth pressure has an impact on the surface roughness of epilayers and their crystal quality. GaN coalescence thicknesses were determined for the investigated growth pressures. The GaN layers were characterized by AFM and HRXRD measurements. HEMT structures were also fabricated and characterized. Among the growth pressures studied, 50, 125 and 200 mbar, 200 mbar was found to be most suitable for GaN/SiC epitaxy.
  • Thumbnail Image
    ItemOpen Access
    The influence of substrate surface preparation on LP MOVPE GaN epitaxy on differently oriented 4H-SiC substrates
    (Elsevier BV * North-Holland, 2008) Caban, P.; Kosciewicz, K.; Strupinski, W.; Wojcik, M.; Gaca, J.; Szmidt, J.; Ozturk, M.; Özbay, Ekmel
    The influence of surface preparation and off-cut of 4H-SiC substrates on morphological and structural properties of GaN grown by low-pressure metalorganic vapor phase epitaxy was studied. Substrate etching has an impact on the surface roughness of epilayers and improves its crystal quality. The GaN layers were characterized by atomic force microscopy (AFM) and high-resolution X-ray diffractometry (HRXRD) measurements. It was observed that on-axis 4H-SiC is most suitable for GaN epitaxy and that substrate etching improves the surface morphology of epilayer.