Browsing by Author "Szmidt, J."

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Open Access
Effect of growth pressure on coalescence thickness and crystal quality of GaN deposited on 4H-SiC
(Elsevier, 2010-09-25) Caban, P.; Strupinski, W.; Szmidt, J.; Wojcik, M.; Gaca, J.; Kelekci, O.; Caliskan, D.; Özbay, Ekmel
The influence of growth pressure on the coalescence thickness and the crystal quality of GaN deposited on 4HSiC by low pressure metalorganic vapor phase epitaxy was studied. It was shown that growth pressure has an impact on the surface roughness of epilayers and their crystal quality. GaN coalescence thicknesses were determined for the investigated growth pressures. The GaN layers were characterized by AFM and HRXRD measurements. HEMT structures were also fabricated and characterized. Among the growth pressures studied, 50, 125 and 200 mbar, 200 mbar was found to be most suitable for GaN/SiC epitaxy.
Open Access
The influence of substrate surface preparation on LP MOVPE GaN epitaxy on differently oriented 4H-SiC substrates
(Elsevier BV * North-Holland, 2008) Caban, P.; Kosciewicz, K.; Strupinski, W.; Wojcik, M.; Gaca, J.; Szmidt, J.; Ozturk, M.; Özbay, Ekmel
The influence of surface preparation and off-cut of 4H-SiC substrates on morphological and structural properties of GaN grown by low-pressure metalorganic vapor phase epitaxy was studied. Substrate etching has an impact on the surface roughness of epilayers and improves its crystal quality. The GaN layers were characterized by atomic force microscopy (AFM) and high-resolution X-ray diffractometry (HRXRD) measurements. It was observed that on-axis 4H-SiC is most suitable for GaN epitaxy and that substrate etching improves the surface morphology of epilayer.
Open Access
Step-edge-induced resistance anisotropy in quasi-free-standing bilayer chemical vapor deposition graphene on SiC
(AIP Publishing, 2014) Ciuk, T.; Cakmakyapan, S.; Özbay, Ekmel; Caban, P.; Grodecki, K.; Krajewska, A.; Pasternak, I.; Szmidt, J.; Strupinski, W.
The transport properties of quasi-free-standing (QFS) bilayer graphene on SiC depend on a range of scattering mechanisms. Most of them are isotropic in nature. However, the SiC substrate morphology marked by a distinctive pattern of the terraces gives rise to an anisotropy in graphene's sheet resistance, which may be considered an additional scattering mechanism. At a technological level, the growth-preceding in situ etching of the SiC surface promotes step bunching which results in macro steps similar to 10 nm in height. In this report, we study the qualitative and quantitative effects of SiC steps edges on the resistance of epitaxial graphene grown by chemical vapor deposition. We experimentally determine the value of step edge resistivity in hydrogen-intercalated QFS-bilayer graphene to be similar to 190 Omega mu m for step height h(S) = 10 nm and provide proof that it cannot originate from mechanical deformation of graphene but is likely to arise from lowered carrier concentration in the step area. Our results are confronted with the previously reported values of the step edge resistivity in monolayer graphene over SiC atomic steps. In our analysis, we focus on large-scale, statistical properties to foster the scalable technology of industrial graphene for electronics and sensor applications. (C) 2014 AIP Publishing LLC.