Browsing by Author "Okyay, Ali Kemal"
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Item Open Access 2-nm laser-synthesized Si nanoparticles for low-power charge trapping memory devices(IEEE, 2014-08) El-Atab, N.; Özcan, Ayşe; Alkış, Sabri; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of embedding Silicon Nanoparticles (Si-NPs) in ZnO based charge trapping memory devices is studied. Si-NPs are fabricated by laser ablation of a silicon wafer in deionized water followed by sonication and filtration. The active layer of the memory was deposited by Atomic Layer Deposition (ALD) and spin coating technique was used to deliver the Si-NPs across the sample. The nanoparticles provided a good retention of charges (>10 years) in the memory cells and allowed for a large threshold voltage (Vt) shift (3.4 V) at reduced programming voltages (1 V). The addition of ZnO to the charge trapping media enhanced the electric field across the tunnel oxide and allowed for larger memory window at lower operating voltages. © 2014 IEEE.Item Open Access ∼3-nm ZnO nanoislands deposition and application in charge trapping memory grown by single ALD step(Nature Publishing Group, 2016) El-Atab, N.; Chowdhury F.; Ulusoy, T. G.; Ghobadi, A.; Nazirzadeh A.; Okyay, Ali Kemal; Nayfeh, A.Low-dimensional semiconductor nanostructures are of great interest in high performance electronic and photonic devices. ZnO is considered to be a multifunctional material due to its unique properties with potential in various applications. In this work, 3-nm ZnO nanoislands are deposited by Atomic Layer Deposition (ALD) and the electronic properties are characterized by UV-Vis-NIR Spectrophotometer and X-ray Photoelectron Spectroscopy. The results show that the nanostructures show quantum confinement effects in 1D. Moreover, Metal-Oxide-Semiconductor Capacitor (MOSCAP) charge trapping memory devices with ZnO nanoislands charge storage layer are fabricated by a single ALD step and their performances are analyzed. The devices showed a large memory window at low operating voltages with excellent retention and endurance characteristics due to the additional oxygen vacancies in the nanoislands and the deep barrier for the trapped holes due to the reduction in ZnO electron affinity. The results show that the ZnO nanoislands are promising in future low power memory applications. © The Author(s) 2016.Item Open Access Actively tunable thin films for visible light by thermo-optic modulation of ZnO(Wiley-VCH Verlag, 2016) Battal, E.; Okyay, Ali KemalApplications of active control of light matter interactions within integrated photonics, hyper-spectral imaging, reconfigurable lasers, and selective bio-surfaces have enormously increased the demand for realization of optical modulation covering the spectrum from ultraviolet (UV) up to infrared (IR) wavelength range. In this study, we demonstrate ZnO-based actively tunable perfect absorber operating within UV and visible spectrum with more than 5 nm shift in the resonant absorption wavelength. Using spectroscopic ellipsometry technique, we extract temperature-dependent optical constants of atomic layer-deposited ZnO within 0.3-1.6 and 4-40 μm spectra. We also observe bandgap narrowing of ZnO at elevated temperatures due to lattice relaxation verified by the red-shift of phonon-modes. At around its bandgap, refractive index variations up to 0.2 is obtained and ZnO is shown to exhibit thermo-optic coefficient as high as 9.17 × 10-4 K-1 around the bandgap which is the largest among well-known large bandgap materials. © 2016 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.Item Open Access All-silicon ultra-broadband infrared light absorbers(Nature Publishing Group, 2016) Gorgulu, K.; Gok, A.; Yilmaz, M.; Topalli, K.; Blylkll, N.; Okyay, Ali KemalAbsorbing infrared radiation efficiently is important for critical applications such as thermal imaging and infrared spectroscopy. Common infrared absorbing materials are not standard in Si VLSI technology. We demonstrate ultra-broadband mid-infrared absorbers based purely on silicon. Broadband absorption is achieved by the combined effects of free carrier absorption, and vibrational and plasmonic absorption resonances. The absorbers, consisting of periodically arranged silicon gratings, can be fabricated using standard optical lithography and deep reactive ion etching techniques, allowing for cost-effective and wafer-scale fabrication of micro-structures. Absorption wavebands in excess of 15 micrometers (5-20 μm) are demonstrated with more than 90% average absorptivity. The structures also exhibit broadband absorption performance even at large angles of incidence (θ = 50°), and independent of polarization.Item Open Access An all-ZnO microbolometer for infrared imaging(Elsevier BV, 2014) Kesim, Y. E.; Battal, E.; Tanrikulu, M. Y.; Okyay, Ali KemalMicrobolometers are extensively used for uncooled infrared imaging applications. These imaging units generally employ vanadium oxide or amorphous silicon as the active layer and silicon nitride as the absorber layer. However, using different materials for active and absorber layers increases the fabrication and integration complexity of the pixel structure. In order to reduce fabrication steps and therefore increase the yield and reduce the cost of the imaging arrays, a single layer can be employed both as the absorber and the active material. In this paper, we propose an all-ZnO microbolometer, where atomic layer deposition grown zinc oxide is employed both as the absorber and the active material. Optical constants of ZnO are measured and fed into finite-difference-time-domain simulations where absorption performances of microbolometers with different gap size and ZnO film thicknesses are extracted. Using the results of these optical simulations, thermal simulations are conducted using finite-element-method in order to extract the noise equivalent temperature difference (NETD) and thermal time constant values of several bolometer structures with different gap sizes, arm and film thicknesses. It is shown that the maximum performance of 171 mK can be achieved with a body thickness of 1.1 μm and arm thickness of 50 nm, while the fastest response with a time constant of 0.32 ms can be achieved with a ZnO thickness of 150 nm both in arms and body. © 2014 Elsevier B.V. All rights reserved.Item Open Access Amyloid-like peptide nanofiber templated titania nanostructures as dye sensitized solar cell anodic materials(Royal Society of Chemistry, 2013) Acar, H.; Garifullin, R.; Aygun, L. E.; Okyay, Ali Kemal; Güler, Mustafa O.One-dimensional titania nanostructures can serve as a support for light absorbing molecules and result in an improvement in the short circuit current (Jsc) and open circuit voltage (Voc) as a nanostructured and high-surface-area material in dye-sensitized solar cells. Here, self-assembled amyloid-like peptide nanofibers were exploited as an organic template for the growth of one-dimensional titania nanostructures. Nanostructured titania layers were utilized as anodic materials in dye sensitized solar cells (DSSCs). The photovoltaic performance of the DSSC devices was assessed and an enhancement in the overall cell performance compared to unstructured titania was observed.Item Open Access An analysis for the broad-band absorption enhancement using plasmonic structures on uncooled infrared detector pixels(SPIE, 2012-05) Lüleç, S. Z.; Küçük, S. E.; Battal, Enes; Okyay, Ali Kemal; Tanrıkulu, M. Y.; Akın, T.This paper introduces an analysis on the absorption enhancement in uncooled infrared pixels using resonant plasmon modes in metal structures, and it reports, for the first time in literature, broad-band absorption enhancement using integrated plasmonic structures in microbolometers for unpolarized long-wave IR detection. Different plasmonic structures are designed and simulated on a stack of layers, namely gold, polyimide, and silicon nitride in order to enhance absorption at the long-wave infrared. The simulated structures are fabricated, and the reflectance measurements are conducted using an FTIR Ellipsometer in the 8-12 μm wavelength range. Finite difference time domain (FDTD) simulations are compared to experimental measurement results. Computational and experimental results show similar spectral reflection trends, verifying broad-band absorption enhancement in the spectral range of interest. Moreover, this paper computationally investigates pixel-wise absorption enhancement by plasmonic structures integrated with microbolometer pixels using the FDTD method. Special attention is given during the design to be able to implement the integrated plasmonic structures with the microbolometers without a need to modify the pre-determined microbolometer process flow. The optimized structure with plasmonic layer absorbs 84 % of the unpolarized radiation in the 8-12 μm spectral range on the average, which is a 22 % increase compared to a reference structure with no plasmonic design. Further improvement may be possible by designing multiply coupled resonant structures.Item Open Access Atomic layer deposited HfO2 based metal insulator semiconductor GaN ultraviolet photodetectors(Elsevier BV, 2014) Kumar, M.; Tekcan, B.; Okyay, Ali KemalA report on GaN based metal insulator semiconductor (MIS) ultraviolet (UV) photodetectors (PDs) with atomic layer deposited (ALD) 5-nm-thick HfO2 insulating layer is presented. Very low dark current of 2.24 × 10-11 A and increased photo to dark current contrast ratio was achieved at 10 V. It was found that the dark current was drastically reduced by seven orders of magnitude at 10 V compared to samples without HfO2 insulating layer. The observed decrease in dark current is attributed to the large barrier height which is due to introduction of HfO2 insulating layer and the calculated barrier height was obtained as 0.95 eV. The peak responsivity of HfO2 inserted device was 0.44 mA/W at bias voltage of 15 V.Item Open Access Atomic Layer Deposition for Vertically Integrated ZnO Thin Film Transistors: Toward 3D High Packing Density Thin Film Electronics(Wiley-VCH Verlag, 2017) Sisman, Z.; Bolat, S.; Okyay, Ali KemalWe report on the first demonstration of the atomic layer deposition (ALD) based three dimensional (3D) integrated ZnO thin film transistors (TFTs) on rigid substrates. Devices exhibit high on-off ratio (∼106) and high effective mobility (∼11.8 cm2 V−1 s−1). It has also been demonstrated that the steps of fabrication result in readily stable electrical characteristics in TFTs, eliminating the need for post-production steps. These results mark the potential of our fabrication method for the semiconducting metal oxide-based vertical-integrated circuits requiring high packing density and high functionality. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, WeinheimItem Open Access Atomic layer deposition synthesized TiOx thin films and their application as microbolometer active materials(AVS Science and Technology Society, 2016) Tanrikulu, M. Y.; Rasouli, H. R.; Ghaffari, M.; Topalli K.; Okyay, Ali KemalThis paper demonstrates the possible usage of TiOx thin films synthesized by atomic layer deposition as a microbolometer active material. Thin film electrical resistance is investigated as a function of thermal annealing. It is found that the temperature coefficient of resistance values can be controlled by coating/annealing processes, and the value as high as -9%/K near room temperature is obtained. The noise properties of TiOx films are characterized. It is shown that TiOx films grown by atomic layer deposition technique could have a significant potential to be used as a new active material for microbolometer-based applications. © 2016 American Vacuum Society.Item Open Access Atomic-layer-deposited zinc oxide as tunable uncooled infrared microbolometer material(Wiley-VCH Verlag, 2014) Battal, E.; Bolat, S.; Tanrikulu, M. Y.; Okyay, Ali Kemal; Akin, T.ZnO is an attractive material for both electrical and optical applications due to its wide bandgap of 3.37 eV and tunable electrical properties. Here, we investigate the application potential of atomic-layer-deposited ZnO in uncooled microbolometers. The temperature coefficient of resistance is observed to be as high as-10.4% K-1 near room temperature with the ZnO thin film grown at 120 °C. Spectral noise characteristics of thin films grown at various temperatures are also investigated and show that the 120 °C grown ZnO has a corner frequency of 2 kHz. With its high TCR value and low electrical noise, atomic-layer-deposited (ALD) ZnO at 120 °C is shown to possess a great potential to be used as the active layer of uncooled microbolometers. The optical properties of the ALD-grown ZnO films in the infrared region are demonstrated to be tunable with growth temperature from near transparent to a strong absorber. We also show that ALD-grown ZnO can outperform commercially standard absorber materials and appears promising as a new structural material for microbolometer-based applications. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.Item Open Access Au/TiO2 nanorod-based Schottky-type UV photodetectors(Wiley, 2012-10-12) Karaagac, H.; Aygun, L. E.; Parlak, M.; Ghaffari, M.; Bıyıklı, Necmi; Okyay, Ali KemalTiO2 nanorods (NRs) were synthesized on fluorine-doped tin oxide (FTO) pre-coated glass substrates using hydrothermal growth technique. Scanning electron microscopy studies have revealed the formation of vertically-aligned TiO2 NRs with length of similar to 2 mu m and diameter of 110128 nm, homogenously distributed over the substrate surface. 130 nm thick Au contacts using thermal evaporation were deposited on the n-type TiO2 NRs at room temperature for the fabrication of NR-based Schottky-type UV photodetectors. The fabricated Schottky devices functioned as highly sensitive UV photodetectors with a peak responsivity of 134.8 A/W (lambda = 350 nm) measured under 3 V reverse bias. (c) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, WeinheimItem Open Access A baseball-bat-like CdTe/TiO2 nanorods-based heterojunction core–shell solar cell(Elsevier, 2013) Karaagac, H.; Parlak, M.; Aygun, L. E.; Ghaffari, M.; Bıyıklı, Necmi; Okyay, Ali KemalRutile TiO2 nanorods on fluorine-doped thin oxide glass substrates via the hydrothermal technique were synthesized and decorated with a sputtered CdTe layer to fabricate a core-shell type n-TiO2/p-CdTe solar cell. Absorbance spectrum verified the absorption contribution of both TiO2 and CdTe to the absorption process. The solar cell parameters, such as open circuit voltage, short circuit current density, fill factor and power conversion efficiency were found to be 0.34 V, 1.27 mA cm-2, 28% and 0.12%, respectively. .Item Open Access Broadband absorption enhancement in an uncooled microbolometer infrared detector(SPIE, 2014) Kebapcı, B.; Dervişoğlu, Ö.; Battal, Enes; Okyay, Ali Kemal; Akın, T.This paper introduces a method for a broadband absorption enhancement in the LWIR range (8-12 μm), in single layer microbolometer pixels with 35 μm pitch. For the first time in the literature, this study introduces a very simple and low cost approach to enhance the absorption by embedding plasmonic structures at the same level as the already existing metallic layer of a microbolometer pixel. The metal layer comprises the electrode and the arm structures on the body. Even though the periodicity of the plasmonic structures is slightly disturbed by the placement of the electrodes and the connecting metal, the metal arms and the electrodes compensate for the lack of the periodicity contributing to the resonance by their coupling with the individual plasmonic resonators. Various plasmonic structures are designed with FDTD simulations. Individual, plasmonically modified microbolometer pixels are fabricated, and an increase in the average absorption due to surface plasmon excitation at Au/Si3N4 interfaces is observed. Plasmonic structures increase the average absorption from 78% to 82% and result in an overall enhancement of 5.1%. A good agreement between the simulation and the FTIR measurement results are obtained within the LWIR range. This work paves the way for integration of the plasmonic structures within conventional microbolometer devices for performance enhancement without introducing additional costs.Item Open Access Broadband one way propagation via dielectric waveguides with unequal effective index(IEEE, 2014) Öner, B. B.; Üstün, K.; Kurt, H.; Okyay, Ali Kemal; Turhan-Sayan, G.We present an efficient approach for broad band one way propagation of light by parallel and unequal dielectric waveguides leading different effective phase shifts. Three dimensional numerical simulations show that 30% operating bandwidth is achieved.Item Open Access Catalytic properties of vanadium diselenide: a comprehensive study on ıts electrocatalytic performance in alkaline, neutral, and acidic media(American Chemical Society, 2017) Ghobadi, T. G. U.; Patil, B.; Karadas, F.; Okyay, Ali Kemal; Yilmaz, E.Here, we report the synthesis of vanadium diselenide (VSe2) three-dimensional nanoparticles (NPs) and two-dimensional (2D) nanosheets (NSs) utilizing nanosecond pulsed laser ablation technique followed by liquid-phase exfoliation. Furthermore, a systematic study has been conducted on the effect of NP and NS morphologies of VSe2 in their catalytic activities toward oxygen reduction reaction (ORR), oxygen evolution reaction (OER) and hydrogen evolution reaction (HER) under alkaline, neutral, and acidic conditions. Research on VSe2 clearly demonstrates that these morphologies do not have a significant difference for ORR and OER; however, a drastic effect of morphology was observed for HER. The ORR activity of both NSs and NPs involves ∼2.85 numbers of electrons with the Tafel slope of 120 mV/dec in alkaline and neutral pH. In alkaline solution, NPs are proved to be an efficient catalyst for OER with an onset potential 1.5 V; however, for HER, NSs have a better onset potential of −0.25 V. Moreover, the obtained NPs have also better catalytic activity with a 400 mV anodic shift in the onset potential compared to NSs. These results provide a reference point for the future application of VSe2 in energy storage and conversion devices and mass production of other 2D materials.Item Open Access Charge Trapping Memory with 2.85-nm Si-Nanoparticles Embedded in HfO2(ECS, 2015-05) El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali Kemal; Nayfeh, A.In this work, the effect of embedding 2.85-nm Si-nanoparticles charge trapping layer in between double layers of high-κ Al2O3/HfO2 oxides is studied. Using high frequency (1 MHz) C-Vgate measurements, the memory showed a large memory window at low program/erase voltages due to the charging of the Si-nanoparticles. The analysis of the C-V characteristics shows that mixed charges are being stored in the Si-nanoparticles where electrons get stored during the program operation while holes dominate in the Si-nanoparticles during the erase operation. Moreover, the retention characteristic of the memory is studied by measuring the memory hysteresis in time. The obtained retention characteristic (35.5% charge loss in 10 years) is due to the large conduction and valence band offsets between the Si-nanoparticles and the Al2O3/HfO2 tunnel oxide. The results show that band engineering is essential in future low-power non-volatile memory devices. In addition, the results show that Si-nanoparticles are promising in memory applications.Item Open Access Comparative study of thin film n-i-p a-Si: H solar cells to investigate the effect of absorber layer thickness on the plasmonic enhancement using gold nanoparticles(Elsevier Ltd, 2015) Islam, K.; Chowdhury F.I.; Okyay, Ali Kemal; Nayfeh, A.In this paper, the effect of gold nanoparticles on n-i-p a-Si:H solar cells with different intrinsic layer (i-layer) thicknesses has been studied. 100nm and 500nm i-layer based n-i-p a-Si:H solar cells were fabricated and colloidal gold (Au) nanoparticles dispersed in water-based solution were spin-coated on the top surface of the solar cells. The Au nanoparticles are of spherical shape and have 100nm diameter. Electrical and quantum efficiency measurements were carried out and the results show an increase in short-circuit current density (Jsc), efficiency and external quantum efficiency (EQE) with the incorporation of the nanoparticles on both cells. Jsc increases from 5.91mA/cm2 to 6.5mA/cm2 (~10% relative increase) and efficiency increases from 3.38% to 3.97% (~17.5% relative increase) for the 100nm i-layer solar cell after plasmonic enhancement whereas Jsc increases from 9.34mA/cm2 to 10.1mA/cm2 (~7.5% relative increase) and efficiency increases from 4.27% to 4.99% (~16.9% relative increase) for the 500nm i-layer cell. The results show that plasmonic enhancement is more effective in 100nm than 500nm i-layer thickness for a-Si:H solar cells. Moreover, the results are discussed in terms of light absorption and electron hole pair generation. © 2015 Elsevier Ltd.Item Open Access Complementary spiral resonators for ultrawideband suppression of simultaneous switching noise in high-speed circuits(Electromagnetics Academy, 2014) Ghobadi, A.; Topalli K.; Bıyıklı, Necmi; Okyay, Ali KemalIn this paper, a novel concept for ultra-wideband simultaneous switching noise (SSN) mitigation in high-speed printed circuit boards (PCBs) is proposed. Using complementary spiral resonators (CSRs) etched on only a single layer of the power plane and cascaded co-centrically around the noise port, ultra-wideband SSN suppression by 30 dB is achieved in a frequency span ranging from 340MHz to beyond 10 GHz. By placing a slit in the co-centric rings, lower cut-off frequency is reduced to 150 MHz, keeping the rest of the structure unaltered. Finally, the power plane structure with modified complementary spiral resonators (MCSRs) is designed, fabricated, and evaluated experimentally. Measurement and simulation results are in well-agreement.Item Open Access Compositional homogeneity in a medical-grade stainless steel sintered with a Mn-Si additive(Elsevier, 2012-06-09) Salahinejad, E.; Hadianfard, M.J.; Ghaffari, M.; Mashhadi, S.B.; Okyay, Ali KemalIn this paper, chemical composition uniformity in amorphous/ nanocrystallization medical-grade stainless steel (ASTM ID: F2581) sintered with a Mn-Si additive was studied via scanning electron microscopy, energy dispersive X-ray spectroscopy, and transmission electron microscopy. The results show that as a result of sintering at 1000 °C, no dissociation of Mn-Si additive particles embedded in the stainless steel matrix occurs. In contrast, sintering at 1050 °C develops a relatively homogeneous microstructure from the chemical composition viewpoint. The aforementioned phenomena are explained by liquation of the Mn-Si eutectic additive, thereby wetting of the main powder particles, penetrating into the particle contacts and pore zones via capillary forces, and providing a path of high diffusivity.