Browsing by Author "Atmaca, G."
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Item Open Access Ab initio study of electronic properties of armchair graphene nanoribbons passivated with heavy metal elements(Elsevier, 2019) Narin, P.; Abbas, J. M.; Atmaca, G.; Kutlu, E.; Lisesivdin, S. B.; Özbay, EkmelIn this study, electronic properties of graphene nanoribbons with armchair edges (AGNRs) have been investigated with Density Functional Theory (DFT). Effects of heavy metal (HM) elements, including Zinc (Zn), Cadmium (Cd) and Mercury (Hg) atoms on electronic behavior of AGNRs have been calculated by passivating for both one and two edges of AGNRs in detail. To explain the electronic behavior of investigated AGNRs, the electronic band structure, the density of states (DOS), total energy have been calculated. Energetically favorable structures have been determined using calculated binding energy values. The obtained bandgap values of investigated structures changes between 0.30 and 0.64 eV. Increasing atomic number of passivation atoms have led to an increment in the bandgap of AGNRs.Item Open Access Effect of substitutional as impurity on electrical and optical properties of β-Si3N4 structure(Elsevier Ltd, 2016) Kutlu, E.; Narin, P.; Atmaca, G.; Sarikavak-Lisesivdin, B.; Lisesivdin, S. B.; Özbay, Ekmelβ-Si3N4 is used as the gate dielectric for surface passivation in GaN-based, high-electron mobility transistors(HEMTs). In this study, the electrical and optical characteristics of the hexagonal β-Si3N4 crystal structure were calculated using density functional theory (DFT) and local-density approximation (LDA). Calculations of the electronic band structure and the density of states (DOS) were made for the pure β-Si3N4 crystal structure and the β-Si3N4 crystal doped with an arsenic (As) impurity atom. In addition, the optical properties such as the static dielectric constant, refractive index, extinction coefficient, absorption coefficient and reflection coefficient were examined depending on the photon energy. As a result of these calculations, it was observed that the As impurity atom drastically changed the electrical and optical properties of the pure β-Si3N4 crystalline structure, and improvements are suggested for potential further studies.Item Open Access Electronic structure of β-Si3N4 crystals with substitutional icosagen group impurities(National Institute of Optoelectronics, 2017) Kutlu, E.; Narin, P.; Atmaca, G.; Sarıkavak-Lişesivdin, B.; Lişesivdin, S. B.; Özbay, EkmelThe β-Si3N4 crystals are widely used in industrial and electronics areas. Therefore, β-Si3N4 has drawn the attention of researchers for many years. In this study, effects of icosagen group impurity atoms in the IIIA group on the electronic properties of the β-Si3N4 crystal were analyzed by using the density functional theory. As a result of these analyses, it was determined that the electronic properties of the crystal change significantly. Basic electronic characteristics for pure β-Si3N4 crystal and icosagen group impurity β-Si3N4 crystals, such as band structures, densities of states, binding energies, and formation energies were investigated. We identified that the band gap of the β-Si3N4 crystal was affected significantly by the impurity, and this change was varying linearly in line with the formation energy for the impurity cases. As a result of calculations, the Al-impurity was found to be the lowest-energy impurity state.Item Open Access Energy relaxation of electrons in InGaN quantum wells(Springer New York LLC, 2015-04) Sarikavak-Lisesivdin, B.; Lisesivdin, S. B.; Balkan, N.; Atmaca, G.; Narin, P.; Cakmak, H.; Özbay, EkmelIn this study, electron energy relaxation mechanisms in HEMT structures with different InxGa1−xN-channel quantum well (QW) widths are investigated. Theoretical value of the inelastic scattering rates is carried out at electron temperatures between 30 K (−243 °C) < Te < 700 K (427 °C). We used both the experimentally determined and calculated electron temperatures to estimate the energy relaxation rates of non-equilibrium electrons. In wide InGaN QWs, power loss of an electron is shown to be significantly smaller than that in the narrower QWs. © 2015, The Minerals, Metals & Materials Society and ASM International.Item Open Access Extraction and scattering analyses of 2D and bulk carriers in epitaxial graphene-on-SiC structure(Elsevier BV, 2014-09) Lisesivdin, S. B.; Atmaca, G.; Arslan, E.; Çakmakyapan S.; Kazar, Ö.; Bütün, S.; Ul-Hassan, J.; Janzén, E.; Özbay, EkmelHall effect measurements of a graphene-on-SiC system were carried out as a function of temperature (1.8-200 K) at a static magnetic field (0.51) With the analysis of temperature dependent single-field Hall data with the Simple Parallel Conduction Extraction Method (SPCEM), bulk and two-dimensional (2D) carrier densities and mobilities were extracted successfully. Bulk carrier is attributed to SIC substrate and 2D carrier is attributed to the graphene layer. For each SPCEM extracted carrier data, relevant three-dimensional or 2D scattering analyses were performed. Each SPCEM extracted carrier data were explained with the related scattering analyses. A temperature independent mobility component, which may related to an interaction between graphene and SIC, was observed for both scattering analyses with the same mobility limiting value. With the SPCEM, effective ionized impurity concentration of SiC substrate, extracted 2D-mobility, and sheet carrier density of the graphene layer are calculated with using temperature dependent static magnetic field Hall data. (c) 2014 Elsevier B.V. All rights reserved.Item Open Access A first principles investigation of the effect of aluminum, gallium and indium impurities on optical properties of β-Si3N4 structure(Elsevier GmbH, 2017) Narin, P.; Kutlu, E.; Atmaca, G.; Lişesivdin, S. B.; Özbay, EkmelIn this study, effects of some impurity atoms included in IIIA group such as Al, Ga, and In on the optical properties of the β-Si3N4 structure have been discussed. The calculations were made using Density Functional Theory (DFT) in 0–15 eV range and local density approximation (LDA) as the exchange-correlation. Using the real and the imaginary parts of the complex dielectric function, the basic optical properties of β-Si3N4 such as dielectric coefficient, refractive index, absorption, reflection coefficients have been investigated. As a result of the calculations, it is determined that optical properties of structure have been significantly changed with doping.Item Open Access Negative differential resistance observation and a new fitting model for electron drift velocity in GaN-based heterostructures(Institute of Electrical and Electronics Engineers, 2018) Atmaca, G.; Narin, P.; Kutlu, E.; Malin, T. V.; Mansurov, V. G.; Zhuravlev, K. S.; Lişesivdin, S. B.; Özbay, EkmelThe aim of this paper is an investigation of electric field-dependent drift velocity characteristics for Al0.3Ga0.7N/AlN/GaN heterostructures without and with in situ Si3N4 passivation. The nanosecond-pulsed current-voltage ( {I}-{V} ) measurements were performed using a 20-ns applied pulse. Electron drift velocity depending on the electric field was obtained from the {I}-{V} measurements. These measurements show that a reduction in peak electron velocity from \text {2.01} \times \text {10}^{\text {7}} to \text {1.39} \times \text {10}^{\text {7}} cm/s after in situ Si3N4 passivation. Also, negative differential resistance regime was observed which begins at lower fields with the implementation of in situ Si3N4 passivation. In our samples, the electric field dependence of drift velocity was measured over 400 kV/cm due to smaller sample lengths. Then, a well-known fitting model was fitted to our experimental results. This fitting model was improved in order to provide an adequate description of the field dependence of drift velocity. It gives reasonable agreement with the experimental drift velocity data up to 475 kV/cm of the electric field and could be used in the device simulators.Item Open Access Numerical optimization of Al-mole fractions and layer thicknesses in normally-on AlGaN-GaN double-channel high electron mobility transistors (DCHEMTs)(Institutul National de Cercetare-Dezvoltare pentru Optoelectronica, 2009-05) Atmaca, G.; Elibol, K.; Lisesivdin, S. B.; Kasap, M.; Özbay, EkmelWe explored the effects of the Al-mole fraction (x) of AlxGa1-xN barrier layers and the thickness of some layers on carrier densities and electron probability densities in normally-on AlGaN-GaN double-channel high electron mobility transistors. Investigations were carried out by solving nonlinear Schrodinger-Poisson equations, self-consistently including polarization induced carriers that are important for GaN-based heterostructures and twodimensional electron gas (2DEG) formation. Strain relaxation limits were also calculated, in which optimized cases were found for the investigated Al-mole fraction and thickness values under pseudomorphic limits. The effect of the investigated thickness changes on electron probability densities show no important change in the overall simulations. In addition to a carrier increase in the selected optimum cases, reasonable mobility behavior is also expected.Item Open Access A structural analysis of ultrathin barrier (In)AlN/GaN heterostructures for GaN-based high-frequency power electronics(Wiley, 2022-04-08) Narin, P.; Kutlu-Narin, E.; Atmaca, G.; Sarikavak-Lisesivdin, B.; Lisesivdin, S. B.; Özbay, EkmelMetal–organic chemical vapor deposition (MOCVD) is one of the best growth methods for GaN-based materials as well-known. GaN-based materials with very quality are grown the MOCVD, so we used this growth technique to grow InAlN/ GaN and AlN/GaN heterostructures in this study. The structural and surface properties of ultrathin barrier AlN/GaN and InAlN/GaN heterostructures are studied by X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements. Screw, edge, and total dislocation densities for the grown samples have been calculated by using XRD results. The lowest dislocation density is found to be 1.69 108 cm2 for Sample B with a lattice-matched In0.17Al0.83N barrier. The crystal quality of the studied samples is determined using (002) symmetric and (102) asymmetric diffractions of the GaN material. In terms of the surface roughness, although reference sample has a lower value as 0.27 nm of root mean square values (RMS), Sample A with 4-nm AlN barrier layer exhibits the highest rough surface as 1.52 nm of RMS. The structural quality of the studied samples is significantly affected by the barrier layer thickness. The obtained structural properties of the samples are very important for potential applications like high-electron mobility transistors (HEMTs).