Tunable visible response of ZnO thin-film phototransistors with atomic layer deposition technique
Author
Aygün, Levent E.
Bozkurt-Oruç, Feyza
Okyay, Ali Kemal
Date
2012Source Title
IEEE Photonics Conference 2012
Publisher
IEEE
Pages
384 - 385
Language
English
Type
Conference PaperItem Usage Stats
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Abstract
We fabricated TFPT with 14-nm-thick n-ZnO channel at 80°C by ALD technique. The drain to source photocurrent due to UV photons can be tuned by changing gate voltage. We also observed that the absorption of sub-bandgap photons could be prevented by operating at positive gate bias. This property could be used for light modulators for visible regime. Moreover, this could be applied to the smart glass technology for electrical voltage controlled transparency. Furthermore, solar-blind UV detectors could also be designed with this technology. © 2012 IEEE.
Keywords
Atomic layerGate voltages
Positive gate bias
Smart glass
Solar-blind
UV photons
Voltage-controlled
ZnO
Light modulators
Photonics
Photons
Zinc oxide
Atomic layer deposition