Analysis of the elliptic-profile cylindrical reflector with a non-uniform resistivity using the complex source and dual-series approach: H-polarization case
Optical and Quantum Electronics
Please cite this item using this persistent URLhttp://hdl.handle.net/11693/20863
An elliptic-profile reflector with varying resistivity is analyzed under the illumination by an H-polarized beam generated by a complex-source-point (CSP) feed. The emphasis is done on the focusing ability that is potentially important in the applications in the optical range related to the partially transparent mirrors. We formulate the corresponding electromagnetic boundary-value problem and derive a singular integral equation from the resistive-surface boundary conditions. This equation is treated with the aid of the regularization technique called Riemann Hilbert Problem approach, which inverts the stronger singular part analytically, and converted to an infinite-matrix equation of the Fredholm 2nd kind. The resulting numerical algorithm has guaranteed convergence. This type of solution provides more accurate and faster results compared to the known method of moments. In the computations, a CSP feed is placed into a more distant geometrical focus of the elliptic reflector, and the near-field values at the closer focus are plotted and discussed. Various far-field radiation patterns including those for the non-uniform resistive variation on the reflector are also presented. © 2013 Springer Science+Business Media New York.
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