Analysis of the elliptic-profile cylindrical reflector with a non-uniform resistivity using the complex source and dual-series approach: H-polarization case

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dc.citation.epage812en_US
dc.citation.issueNumber8en_US
dc.citation.spage797en_US
dc.citation.volumeNumber45en_US
dc.contributor.authorOğuzer, T.en_US
dc.contributor.authorAltintaş, A.en_US
dc.contributor.authorNosich, A. I.en_US
dc.date.accessioned2016-02-08T09:36:46Z
dc.date.available2016-02-08T09:36:46Z
dc.date.issued2013en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.description.abstractAn elliptic-profile reflector with varying resistivity is analyzed under the illumination by an H-polarized beam generated by a complex-source-point (CSP) feed. The emphasis is done on the focusing ability that is potentially important in the applications in the optical range related to the partially transparent mirrors. We formulate the corresponding electromagnetic boundary-value problem and derive a singular integral equation from the resistive-surface boundary conditions. This equation is treated with the aid of the regularization technique called Riemann Hilbert Problem approach, which inverts the stronger singular part analytically, and converted to an infinite-matrix equation of the Fredholm 2nd kind. The resulting numerical algorithm has guaranteed convergence. This type of solution provides more accurate and faster results compared to the known method of moments. In the computations, a CSP feed is placed into a more distant geometrical focus of the elliptic reflector, and the near-field values at the closer focus are plotted and discussed. Various far-field radiation patterns including those for the non-uniform resistive variation on the reflector are also presented.en_US
dc.identifier.doi10.1007/s11082-013-9695-zen_US
dc.identifier.issn0306-8919
dc.identifier.urihttp://hdl.handle.net/11693/20863
dc.language.isoEnglishen_US
dc.publisherSpringeren_US
dc.relation.isversionofhttp://dx.doi.org/10.1007/s11082-013-9695-zen_US
dc.source.titleOptical and Quantum Electronicsen_US
dc.subjectElectromagnetic scatteringen_US
dc.subjectMethod of analytical regularizationen_US
dc.subjectOptical devicesen_US
dc.subjectCylindrical reflectorsen_US
dc.subjectElectromagnetic scatteringen_US
dc.subjectFar field radiation patternsen_US
dc.subjectGuaranteed convergenceen_US
dc.subjectMethod of analytical regularizationen_US
dc.subjectRegularization techniqueen_US
dc.subjectRiemann Hilbert problemsen_US
dc.subjectSingular integral equationsen_US
dc.subjectAlgorithmsen_US
dc.subjectMatrix algebraen_US
dc.subjectMethod of momentsen_US
dc.subjectOptical devicesen_US
dc.subjectReflectionen_US
dc.titleAnalysis of the elliptic-profile cylindrical reflector with a non-uniform resistivity using the complex source and dual-series approach: H-polarization caseen_US
dc.typeArticleen_US
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