Fabrication and characterization of amorphous silicon microcavities
Author
Tanriseven, Selim
Advisor
Serpengüzel, Ali
Date
1999Publisher
Bilkent University
Language
English
Type
ThesisItem Usage Stats
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Abstract
In this thesis, planar amorphous silicon microcavities were fabricated and
characterized at room temperature.
Microcavities were realized by embedding the active amorphous silicon layer
between distributed Bragg reflectors, which are composed of alternating silicon
oxide and silicon nitride layers. All of the layers were grown by plasma enhanced
chemical vapor deposition on silicon substrates. By tuning the cavity mode to
emission maximum of amorphous silicon, a narrow and enhanced emission line is
obtained.
Device characterization was done by means of photoluminescence, and
reflectance measurements. The experimental results compare favorably with the
theoretical calculations performed by transfer matrix method.