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      Fabrication and characterization of amorphous silicon microcavities

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      Author
      Tanriseven, Selim
      Advisor
      Serpengüzel, Ali
      Date
      1999
      Publisher
      Bilkent University
      Language
      English
      Type
      Thesis
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      Abstract
      In this thesis, planar amorphous silicon microcavities were fabricated and characterized at room temperature. Microcavities were realized by embedding the active amorphous silicon layer between distributed Bragg reflectors, which are composed of alternating silicon oxide and silicon nitride layers. All of the layers were grown by plasma enhanced chemical vapor deposition on silicon substrates. By tuning the cavity mode to emission maximum of amorphous silicon, a narrow and enhanced emission line is obtained. Device characterization was done by means of photoluminescence, and reflectance measurements. The experimental results compare favorably with the theoretical calculations performed by transfer matrix method.
      Keywords
      Microcavity
      Distributed Bragg Reflector
      Thin Film
      FabryPerot
      Quality Factor
      Permalink
      http://hdl.handle.net/11693/18106
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      • Dept. of Physics - Master's degree 160
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