XPS studies of SiO2/Si system under external bias

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buir.contributor.authorSüzer, Şefik
dc.citation.epage2943en_US
dc.citation.issueNumber13en_US
dc.citation.spage2939en_US
dc.citation.volumeNumber107en_US
dc.contributor.authorUlgut, B.en_US
dc.contributor.authorSüzer, Şefiken_US
dc.date.accessioned2016-02-08T10:30:18Z
dc.date.available2016-02-08T10:30:18Z
dc.date.issued2003en_US
dc.departmentDepartment of Chemistryen_US
dc.description.abstractThermally grown SiO2 layers on Si (100) substrate have been subjected to different external voltage bias during XPS analysis to induce changes in the measured binding energy difference between Si4+ and Si0 in Si2p and SiKLL regions. The Si2pp binding energy difference increases from 3.2 to 4.8 for samples containing 1-7 nm oxide thickness, and furthermore, this difference can be influenced by application of an external bias to the sample. Application of negative d.c. bias increases the binding energy difference, whereas positive bias decreases it. The voltage dependence of the binding energy difference exhibits a sigmoid character with an abrupt change near 0 V. Both the binding energy difference and differential change between the positive and negative bias have similar functional dependence on the thickness. This is attributed to differential charging between the silicon oxide layer and silicon substrate, which is decreased when a positive bias is applied to the sample (and therefore attracting a larger proportion of the stray electrons from the vacuum chamber to partially neutralize the oxide). Similarly, when negative bias is applied, the stray electrons are repelled from the sample resulting in less neutralization and an increased differential charging. Through external biasing, it is determined that charging in the SiO2/Si system persists all of the way down to 1 nm. Application of a.c. (square-wave) bias is equivalent to simultaneous application of negative and positive bias together. However, the differential change in the binding energy difference in the positive and negative cycle is frequency dependent and approaches to the d.c. results at lower frequencies.en_US
dc.identifier.doi10.1021/jp022003zen_US
dc.identifier.issn1089-5647
dc.identifier.urihttp://hdl.handle.net/11693/24500
dc.language.isoEnglishen_US
dc.publisherAmerican Chemical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/jp022003zen_US
dc.source.titleJournal of Physical Chemistry Ben_US
dc.subjectExternal biasen_US
dc.subjectSquare wave biasen_US
dc.subjectStray electronsen_US
dc.subjectBinding energyen_US
dc.subjectElectronsen_US
dc.subjectGrowth (materials)en_US
dc.subjectSilicaen_US
dc.subjectSiliconen_US
dc.subjectThickness measurementen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectInterfaces (materials)en_US
dc.titleXPS studies of SiO2/Si system under external biasen_US
dc.typeArticleen_US

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