Deposition and stability of metal ions on oxidized silicon surfaces: electrochemical correlation

dc.citation.epage1154en_US
dc.citation.spage1151en_US
dc.citation.volumeNumber114-116en_US
dc.contributor.authorSüzer, S.en_US
dc.date.accessioned2016-02-08T10:35:45Z
dc.date.available2016-02-08T10:35:45Z
dc.date.issued2001en_US
dc.departmentDepartment of Chemistryen_US
dc.description.abstractXPS is used to determine the chemical state of Au, Hg, Tl, Pb and Bi deposited from their corresponding aqueous solutions on oxidized silicon or gold surfaces. It is determined that Au and Hg, having positive electrochemical reduction potentials, deposit in their 0-valent state, but Tl, Pb and Bi, having small positive or negative electrochemical reduction potentials, deposit in their corresponding ionic states, confirming our previous hypothesis about the electrochemical correlation. Electrochemical deposition of Au from aqueous solutions on to silicon electrodes yields 0-valent Au on both (+) and (-) polarized electrodes, with the only difference that more gold is deposited on the negatively biased one.en_US
dc.identifier.doi10.1016/S0368-2048(00)00302-9en_US
dc.identifier.issn0368-2048
dc.identifier.urihttp://hdl.handle.net/11693/24888
dc.language.isoEnglishen_US
dc.publisherElsevier Science Publishersen_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/S0368-2048(00)00302-9en_US
dc.source.titleJournal of Electron Spectroscopy and Related Phenomenaen_US
dc.subjectXPSen_US
dc.subjectChemical states of Auen_US
dc.subjectHgen_US
dc.subjectTlen_US
dc.subjectPben_US
dc.subjectBien_US
dc.subjectReduction potentialsen_US
dc.titleDeposition and stability of metal ions on oxidized silicon surfaces: electrochemical correlationen_US
dc.typeArticleen_US

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