Chemical vapor deposition of boron nitride nanotubes

buir.advisorBengü, Erman
dc.contributor.authorÇiftçi, Niyazi Okan
dc.date.accessioned2016-01-08T19:59:01Z
dc.date.available2016-01-08T19:59:01Z
dc.date.issued2013
dc.departmentDepartment of Chemistryen_US
dc.descriptionAnkara : The Department of Chemistry and the Graduate School of Engineering and Science of Bilkent University, 2013.en_US
dc.descriptionThesis (Master's) -- Bilkent University, 2013.en_US
dc.descriptionIncludes bibliographical references leaves 53-60.en_US
dc.description.abstractSince ancient times materials that are available and used by people constitute indispensable constituent parts of world history. The historical ages are named after the materials which paved an irrevocable way to this stream and revolutionize the progress of history by changing the rhythm of anthropological breakthrough irreversibly. People have used these materials either directly borrowing from nature or by transforming those that are given. As we approach to modern society two methods namely a top-down method using transmission of experiences of before generations conventionally and bottom-up method by application of modern science and technology to understand subtleties of materials and engineering them for the specific goals. Boron nitride nanotubes are one class of these materials having superior properties to the conventional ones. High strength, electrically insulator property, controllable wide band gap and high oxidation resistance as compared to carbon nanotubes put them to the first ranks for the design of the future devices for our modern society. Hence a simple and inexpensive way of production of this kind of materials is utmost importance. For this in this thesis an inexpensive and a very practical way of BNNTs production is elucidated. The reactants boron (B), iron (III) oxide (Fe2O3) and magnesium oxide (MgO) are used as solid precursors. A CVD furnace reaching up till 1200 oC with a special design of added concentric quartz tubes equipped with NH3 and Argon gas served as reaction chamber.en_US
dc.description.degreeM.S.en_US
dc.description.statementofresponsibilityÇiftçi, Niyazi Okanen_US
dc.format.extentxi, 60 leaves, illustrations, tables, graphsen_US
dc.identifier.itemidB139125
dc.identifier.urihttp://hdl.handle.net/11693/16772
dc.language.isoEnglishen_US
dc.publisherBilkent Universityen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectBoron nitride nanotubes (BNNTs)en_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.subject.lccQC176.8.N35 C53 2013en_US
dc.subject.lcshNanotubes.en_US
dc.subject.lcshNanostructured materials.en_US
dc.subject.lcshBoron nitride.en_US
dc.subject.lcshChemical vapor deposition.en_US
dc.titleChemical vapor deposition of boron nitride nanotubesen_US
dc.typeThesisen_US

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