Electron initiated impact ionization in AlGaN alloys

dc.citation.epageL62
dc.citation.issueNumber10
dc.citation.spageL59
dc.citation.volumeNumber17
dc.contributor.authorBulutay, C.
dc.date.accessioned2016-02-08T10:32:18Z
dc.date.available2016-02-08T10:32:18Z
dc.date.issued2002
dc.departmentDepartment of Physics
dc.description.abstractDetailed impact ionization (II) analysis of electrons is presented for AlGaN alloys as a vital resource for solar-blind avalanche photodiode and high power transistor applications. Necessary ingredients for the II characterization are supplied from a recent experiment on the GaN end, and a Keldysh analysis for the AlN end, of the alloy AlGaN. High-field electron dynamics are simulated using an ensemble Monte Carlo framework, accounting for all valleys in the lowest two conduction bands, obtained from accurate empirical pseudopotential band structure computations. The effect of alloy scattering on II is considered and observed to be significant. For any AlxGa1-xN alloy, the electron II coefficients are found to obey the form, A exp(-K/F), for the electric field, F.
dc.identifier.doi10.1088/0268-1242/17/10/102
dc.identifier.issn0268-1242
dc.identifier.urihttp://hdl.handle.net/11693/24643
dc.language.isoEnglish
dc.publisherInstitute of Physics
dc.relation.isversionofhttp://dx.doi.org/10.1088/0268-1242/17/10/102
dc.source.titleSemiconductor Science and Technology
dc.subjectAluminum alloys
dc.subjectBand structure
dc.subjectElectric field effects
dc.subjectElectrons
dc.subjectMonte Carlo methods
dc.subjectPhotodiodes
dc.subjectConduction bands
dc.subjectImpact ionization
dc.titleElectron initiated impact ionization in AlGaN alloys
dc.typeArticle

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