Characterization of thermally poled germanosilicate thin films

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buir.contributor.authorAydınlı, Atilla
dc.citation.epage4708en_US
dc.citation.issueNumber20en_US
dc.citation.spage4698en_US
dc.citation.volumeNumber12en_US
dc.contributor.authorOzean, A.en_US
dc.contributor.authorDigonnet, M.J.F.en_US
dc.contributor.authorKino G.S.en_US
dc.contributor.authorAy F.en_US
dc.contributor.authorAydınlı, Atillaen_US
dc.date.accessioned2016-02-08T10:27:57Z
dc.date.available2016-02-08T10:27:57Z
dc.date.issued2004en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractWe report measurements of the nonlinearity profile of thermally poled low-loss germanosilicate films deposited on fused-silica substrates by PECVD, of interest as potential electro-optic devices. The profiles of films grown and poled under various conditions all exhibit a sharp peak ∼0.5 μm beneath the anode surface, followed by a weaker pedestal of approximately constant amplitude down to a depth of 13-16 μm, without the sign reversal typical of poled undoped fused silica. These features suggest that during poling, the films significantly slow down the injection of positive ions into the structure. After local optimization, we demonstrate a record peak nonlinear coefficient of ∼1.6 pm/V, approximately twice as strong as the highest reliable value reported in thermally poled fused silica glass, a significant improvement that was qualitatively expected from the presence of Ge. ©2004 Optical Society of America.en_US
dc.description.provenanceMade available in DSpace on 2016-02-08T10:27:57Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 70227 bytes, checksum: 26e812c6f5156f83f0e77b261a471b5a (MD5) Previous issue date: 2004en
dc.identifier.doi10.1364/OPEX.12.004698en_US
dc.identifier.issn10944087
dc.identifier.urihttp://hdl.handle.net/11693/24345
dc.language.isoEnglishen_US
dc.publisherOptical Society of American (OSA)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OPEX.12.004698en_US
dc.source.titleOptics Expressen_US
dc.subjectAnodesen_US
dc.subjectElectrooptical devicesen_US
dc.subjectFused silicaen_US
dc.subjectGermanium compoundsen_US
dc.subjectOptimizationen_US
dc.subjectPlasma enhanced chemical vapor depositionen_US
dc.subjectSilicatesen_US
dc.subjectSurface treatmenten_US
dc.subjectThermodynamicsen_US
dc.subjectThin filmsen_US
dc.subjectElectro-optic phasesen_US
dc.subjectLocal optimizationen_US
dc.subjectNonlinear materialsen_US
dc.subjectUV polingen_US
dc.subjectNonlinear opticsen_US
dc.titleCharacterization of thermally poled germanosilicate thin filmsen_US
dc.typeArticleen_US

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