Trapping centers in undoped GaS layered single crystals

buir.contributor.authorAydınlı, Atilla
dc.citation.epage606en_US
dc.citation.issueNumber3-4en_US
dc.citation.spage603en_US
dc.citation.volumeNumber77en_US
dc.contributor.authorGasanly, N. M.en_US
dc.contributor.authorAydınlı, Atillaen_US
dc.contributor.authorYüksek, N. S.en_US
dc.contributor.authorSalihoglu, Ö.en_US
dc.date.accessioned2016-02-08T10:29:35Z
dc.date.available2016-02-08T10:29:35Z
dc.date.issued2003en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractNominally undoped p-GaS layered single crystals were grown using the Bridgman technique. Thermally stimulated current measurements in the temperature range 10-300 K were performed at a heating rate of 0.10 K/s. The analysis of the data revealed six trap levels at 0.05, 0.06, 0.12, 0.63, 0.71, and 0.75 eV. The calculations for these traps yielded 1.2 × 10-21, 2.9 × 10-23, 2.4 × 10-21, 8.0 × 10-9, 1.9 × 10-9 and 4.3 × 10-10 cm2 for the capture cross sections and 1.6 × 1013, 5.0 × 1012, 7.3 × 1012, 1.2 × 1014, 8.9 × 1013 and 2.6 × 1013 cm-3 for the concentrations, respectively.en_US
dc.identifier.doi10.1007/s00339-002-2035-yen_US
dc.identifier.issn0947-8396
dc.identifier.urihttp://hdl.handle.net/11693/24449
dc.language.isoEnglishen_US
dc.publisherSpringeren_US
dc.relation.isversionofhttp://dx.doi.org/10.1007/s00339-002-2035-yen_US
dc.source.titleApplied Physics A: Materials Science and Processingen_US
dc.subjectCalculationsen_US
dc.subjectCrystal growthen_US
dc.subjectElectric current measurementen_US
dc.subjectElectron trapsen_US
dc.subjectSingle crystalsen_US
dc.subjectThermal effectsen_US
dc.subjectBridgman techniqueen_US
dc.subjectGallium sulfideen_US
dc.subjectThermally stimulated current measurementsen_US
dc.subjectTrapping centersen_US
dc.subjectSemiconducting gallium compoundsen_US
dc.titleTrapping centers in undoped GaS layered single crystalsen_US
dc.typeArticleen_US

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