Formation of alkylsilane-based monolayers on gold
dc.citation.epage | 6801 | en_US |
dc.citation.issueNumber | 24 | en_US |
dc.citation.spage | 6800 | en_US |
dc.citation.volumeNumber | 124 | en_US |
dc.contributor.author | Owens, T. M. | en_US |
dc.contributor.author | Nicholson, K. T. | en_US |
dc.contributor.author | Banaszak Holl, M. M. | en_US |
dc.contributor.author | Süzer, S. | en_US |
dc.date.accessioned | 2016-02-08T10:32:56Z | |
dc.date.available | 2016-02-08T10:32:56Z | |
dc.date.issued | 2002 | en_US |
dc.department | Department of Chemistry | en_US |
dc.description.abstract | The formation of monolayers of alkylsilanes on a gold surface is characterized by X-ray photoelectron and reflection-absorption infrared spectroscopies. The reaction occurs through the activation of multiple Si-H bonds. Reactivity of the newly synthesized systems to oxygen and water is reported. Copyright © 2002 American Chemical Society. | en_US |
dc.identifier.doi | 10.1021/ja025755f | en_US |
dc.identifier.issn | 0002-7863 | |
dc.identifier.uri | http://hdl.handle.net/11693/24687 | |
dc.language.iso | English | en_US |
dc.publisher | American Chemical Society | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1021/ja025755f | en_US |
dc.source.title | Journal of the American Chemical Society | en_US |
dc.subject | Alkyl group | en_US |
dc.subject | Gold | en_US |
dc.subject | Silane derivative | en_US |
dc.subject | Absorption spectroscopy | en_US |
dc.subject | Energy | en_US |
dc.subject | Oxidation | en_US |
dc.subject | X ray photoelectron spectroscopy | en_US |
dc.title | Formation of alkylsilane-based monolayers on gold | en_US |
dc.type | Article | en_US |
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