X-ray induced reduction of Au and Pt ions on silicon substrates

Abstract

Prolonged exposure to X-rays of HAuCl4, PtCl4 and their mixtures, deposited from an aqueous solution onto a silicon substrate, causes chemical reduction of the metal ions to their metallic states. The corresponding oxidation reaction is the conversion of chloride ions to chlorine. The resultant metal atoms aggregate to form metallic/bimetallic nanoclusters as evidenced from their XPS chemical shifts. Hence, X-rays are usable for in-situ nanoparticle production or for direct-writing applications on silicon substrates. © 2007 Elsevier B.V. All rights reserved.