Nitrogen incorporation and optical studies of GaAsSbN∕GaAs single quantum well heterostructures

dc.citation.epage053106-8en_US
dc.citation.issueNumber5en_US
dc.citation.spage053106-1en_US
dc.citation.volumeNumber102en_US
dc.contributor.authorNunna, K.en_US
dc.contributor.authorIyer, S.en_US
dc.contributor.authorWu, L.en_US
dc.contributor.authorLi, J.en_US
dc.contributor.authorBharatan, S.en_US
dc.contributor.authorWei, X.en_US
dc.contributor.authorSenger, R. T.en_US
dc.contributor.authorBajaj, K. K.en_US
dc.date.accessioned2015-07-28T12:06:58Z
dc.date.available2015-07-28T12:06:58Z
dc.date.issued2007en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractIn this work, the effects of N incorporation on the optical properties of GaAsSbN/GaAs single quantum wells (SQWs) have been investigated using temperature, excitation, and magnetic dependencies of photoluminescence (PL) characteristics. These layers were grown in an elemental solid source molecular beam epitaxy system with a rf plasma N source. The N concentrations in the range of 0.5%-2.5% were investigated in this study. The SQW with N similar to 0.5% exhibits a behavior similar to that in an intermediate regime where the contributions from the localized states in the band gap are dominant. The temperature and excitation dependencies of the PL characteristics indicate that for the N concentration of 0.9% and above, the alloy behavior is analogous to that of a regular alloy and the changes in optical properties are only marginal. The conduction band effective mass (m(eff)) values computed from the magnetophotoluminescence spectra using a variational formalism and the band anticrossing model are in good agreement and indicate enhanced values of m(eff). However, there is no significant variation in m(eff) values of QWs for N >= 0.9%. Small redshift of about 30-50 meV for the temperature variations from 10 to 300 K in conjunction with unusually small blueshift observed in the excitation dependence of PL for N >= 0.9% indicate that this system holds a great promise for laser applications at 1.55 mu m and beyond.en_US
dc.identifier.doi10.1063/1.2777448en_US
dc.identifier.eissn1089-7550
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/11693/13562
dc.language.isoEnglishen_US
dc.publisherA I P Publishing LLCen_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.2777448en_US
dc.source.titleJournal of Applied Physicsen_US
dc.subjectMolecular-beam Epitaxyen_US
dc.subjectMbe Growthen_US
dc.subjectGaasen_US
dc.subjectPhotoluminescenceen_US
dc.subjectTemperatureen_US
dc.subjectAlloysen_US
dc.subjectGainnassben_US
dc.subjectEmissionen_US
dc.titleNitrogen incorporation and optical studies of GaAsSbN∕GaAs single quantum well heterostructuresen_US
dc.typeArticleen_US

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