Effect of coumarin concentration on the physical properties of CdO nanostructures

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buir.contributor.authorBıyıklı, Necmi
dc.citation.epage5243en_US
dc.citation.issueNumber4en_US
dc.citation.spage5237en_US
dc.citation.volumeNumber40en_US
dc.contributor.authorSahin, B.en_US
dc.contributor.authorBayansal, F.en_US
dc.contributor.authorYuksel, M.en_US
dc.contributor.authorBıyıklı, Necmien_US
dc.contributor.authorCetinkara, H. A.en_US
dc.date.accessioned2015-07-28T11:56:40Z
dc.date.available2015-07-28T11:56:40Z
dc.date.issued2014-05en_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractIn this work, nanostructured CdO films with different coumarin contents in the growth solution were fabricated on glass substrates by the SILAR method. The effects of coumarin content in the bath on optical, structural and morphological properties were studied by means of (UV–vis) spectrophotometer, SEM and XRD analysis. The analysis showed that the band gaps, surface morphologies and XRD peak intensities of the CdO films were found to change with coumarin content. A change in the band gap energy can be attributed to the improvement in crystallinity of the samples. XRD analysis showed that, the films have poly-crystalline structures with decent crystallinity levels.en_US
dc.description.provenanceMade available in DSpace on 2015-07-28T11:56:40Z (GMT). No. of bitstreams: 1 10.1016-j.ceramint.2013.10.093.pdf: 2716143 bytes, checksum: 494e6d300812d374790dd422a56f563d (MD5)en
dc.identifier.doi10.1016/j.ceramint.2013.10.093en_US
dc.identifier.issn0272-8842
dc.identifier.urihttp://hdl.handle.net/11693/11032
dc.language.isoEnglishen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.ceramint.2013.10.093en_US
dc.source.titleCeramics Internationalen_US
dc.subjectNanostructured filmsen_US
dc.subjectBand gapen_US
dc.subjectSILARen_US
dc.subjectCoumarin effecten_US
dc.titleEffect of coumarin concentration on the physical properties of CdO nanostructuresen_US
dc.typeArticleen_US

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